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KrF Excimer Laser Direct Writing of Titanium Lines: Modeling and Application to the Fabrication of Ti:Linbo3 Waveguides

Published online by Cambridge University Press:  26 February 2011

M. Meunier
Affiliation:
Ecole Polytechnique de Montréal, Groupe des Couches Minces and Département de Génie Physique, Montréal, Canada.
C. Lavoie
Affiliation:
Ecole Polytechnique de Montréal, Groupe des Couches Minces and Département de Génie Physique, Montréal, Canada.
S. Boivin
Affiliation:
Ecole Polytechnique de Montréal, Groupe des Couches Minces and Département de Génie Physique, Montréal, Canada.
R. Izquierdo
Affiliation:
Ecole Polytechnique de Montréal, Groupe des Couches Minces and Département de Génie Physique, Montréal, Canada.
P. Desjardins
Affiliation:
Ecole Polytechnique de Montréal, Groupe des Couches Minces and Département de Génie Physique, Montréal, Canada.
S. I. Najafi
Affiliation:
Ecole Polytechnique de Montréal, Groupe des Couches Minces and Département de Génie Physique, Montréal, Canada.
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Abstract

The deposition of titanium lines by KrF excimer laser direct writing on lithium niobate (LiNbO3) has been investigated. A detailled study of the line profile has been performed since this is critical in the fabrication of Ti:LiNbO3 optical waveguides. We show that at a low power density E, the maximum thickness t is proportional to E, while increasing E leads to the diffusion of Ti into LiNbO3 resulting in a saturation and even a decrease in thickness. Preliminary results on Ti:LiNbO3 optical waveguides show that their characteristics are similar to those made by conventional methods.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

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References

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