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Jet Vapor Deposition of Transparent Conductive ZnO:Al Thin Films for Photovoltaic Applications

Published online by Cambridge University Press:  10 February 2011

H. Han ,
J.-Z. Zhang ,
B. L. Halpern ,
J. J. Schmitt  and
J. Del Cueto
H. Han
Affiliation:
Jet Process Corporation, 24 Science Park, New Haven, CT 06511
J.-Z. Zhang
Affiliation:
Jet Process Corporation, 24 Science Park, New Haven, CT 06511
B. L. Halpern
Affiliation:
Jet Process Corporation, 24 Science Park, New Haven, CT 06511
J. J. Schmitt
Affiliation:
Jet Process Corporation, 24 Science Park, New Haven, CT 06511
J. Del Cueto
Affiliation:
Lockheed Martin Astronautics, PO Box 179, M.S. F3085, Denver, CO 80201
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Abstract

A novel, proprietary, and general approach to depositing thin films and coatings, The novel Jet Vapor Deposition TM (JVDTM) process is described, in which single or multiple “jets in low vacuum” are coupled with “mobile substrates” to generate a wide range of multicomponent, multilayer and “host-guest” thin films and coatings. Highly transparent and conducting aluminum-doped ZnO (ZnO:A1) thin films have been deposited at room temperature on glass slide, flexible polymer and thin film PV coated substrates by the JVDTM process. The thin films obtained from the optimized operating conditions have an average transmittance of about 85% in the visible range and electrical resistivities of 7 to 10×10-4 Ω-cm. Proper control of substrate bias, dopant content, deposition rate, and oxygen to metal ratio are the keys to depositing low resistivity and high transparency thin films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 426: Symposium J – Thin Films for Photovoltaic and Related Device , 1996 , 491
Copyright
Copyright © Materials Research Society 1996

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