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Ion-Beam Deposition of Thin Films:Influence on Surface and Volume Microstructure

  • G. A. Al-Jumaily (a1), J. J. Mcnally (a1) and J. R. Mcneil (a1)

Abstract

The effects of ion bombardment during film deposition on surface and volume microstructure were studied. Both metal and dielectric films were investigated. Scattered light and optical constants were examined for evaporated, sputtered and ion assisted films.

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References

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