Hostname: page-component-76fb5796d-45l2p Total loading time: 0 Render date: 2024-04-26T15:06:48.880Z Has data issue: false hasContentIssue false
  • English
  • Français

Ion Implantation into Nb/NbO/PbAuIn Josephson Tunnel Junctions

Published online by Cambridge University Press:  25 February 2011

G. J. Clark  and
S. I. Raider
G. J. Clark
Affiliation:
IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598
S. I. Raider
Affiliation:
IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598
Get access

Abstract

Boron ions were implanted into completed planar and edge Nb/Nb oxide/PbAuIn Josephson tunnel junctions to directly trim the Josephson pair currents, Io. The implantation caused an increase in Io and in the junction subgap conductance and a decrease in the junction energy gap. For a fixed junction fabrication procedure, the variations were observed to be monotonic with 11B implant dose. Optimum trimming was found when the 11B ions were implanted such that the peak in the depth distribution occurred at the tunnel barrier. The implantation caused an increase in Io and in the junction subgap conductance and a decrease in the junction energy gap. The implanted junctions are stable at 80°C and under storage.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 27: Symposium E – Ion Implantation and Ion Beam Processing of Materials , 1983 , 577
Copyright
Copyright © Materials Research Society 1984

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Special Issue on Josephson-Junction Devices, IEEE Transactions on Electron Devices ED-27 1855 (1980).Google Scholar
2. Raider, S. I. (unpublished data).Google Scholar
3. Lee, Y. H. and Brosious, P. R., Appl. Phys. Letters 40, 347 (1982).Google Scholar
4. Pie, S. S., Fulton, T. A., Dunkleberger, L. N. and Keane, R. A., IEEE Trans. Magn., MAG-19, 820 (1983).Google Scholar
5. Raider, S. I. and Drake, R. E., IEEE Trans. Magn., MAG-17, 299 (1981).Google Scholar
6. Ziegler, J. F., Biersack, J. P., Littmark, U., “The Stopping and Range of Ions in Matter,” Volume 1, Pergamon Press (1984).Google Scholar