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Ion Beam Techniques for Low K Materials Characterization

  • H. Bakhru (a1), A. Kumar (a1), T. Kaplan (a1), M. Delarosa (a2), J. Fortin (a2), G.-R. Yang (a2), T.-M. Lu (a2), S. Kim (a2), C. Steinbruchel (a2), X. Tang (a2), J. A. Moore (a2), B. Wang (a2), J. McDonald (a2), S. Nitta (a2), V. Pisupatti (a2), A. Jain (a2), P. Wayner (a2), J. Plawsky (a2), W. Gill (a2) and C. Jin (a3)...

Abstract

Ion beam analysis techniques have become very useful for characterization of low k materials. Studies on several ion beam analysis techniques will be discussed. Rutherford Backscattering Spectrometry (RBS) provides a very powerful analytical technique for the thickness and porosity measurements on porous Si0 2 films. Nuclear Reaction Analysis (NRA) techniques for hydrogen and fluorine profiling are very useful to characterize fluorinated polymer and fluorinated oxide films. Examples of low k materials including Si02:F, Parylene-AF and Teflon-AF will be discussed. Fluorine diffusion in to metals and various interface effects between metal and low k materials will be presented.

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References

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1..See, for example, Low-Dielectric Constant Materials for ULSI Interlayer Dielectric Applications, Lee, W. W. and Ho, P. S., Guest Editors, Materials Research Society Bulletin, Vol. 22, No. 10, p. 1969, October 1997.
2. Hirvonen, J. -P., Handbook of Modern Ion Beam Material Analysis, edited by Natasi, M., Materials Research Society, Pittsburgh (1995).
3. Bakhru, H., Encyclopedia of Material Science and Engineering, Edited by B., Michael, Bever, Peragamon Press 1990, pp. 24022407.
4. Doolittle, L. R., Algorithms for Rapid simulation of Rutherford backscattering spectra, Nucl. Instr. And Meth. B9, 334, (1985)
5. Morris, W. G., S. Fesseha. and H, H. Bakhru, Microbeam RBS and PIXE Applied to Microelectronics., Nucl. Instr. and Meth. B24 /25 635 (1987).
6.For review, see Lu, T.-M. and Moore, J. A., Materials Research Society Bulletin, Vol.22, No. 10, p. 28, October 1997.
7. Kumar, A., Bakhru, H., Haberl, A. W., Carpio, R. A., and Ricci, A., Characterization of fluorinated silicon dioxide films by nuclear reaction analysis and optical techniques, AIP Conf.Proc. (USA), no.392, pt.1, p. 697700
8. Lanford, W., Handbook of Modern Ion Beam Material Analysis, edited by Natasi, Michael, Materials Research Society 1995, ch. 8.
9. Tomozawa, M., Han, Won-Taek; Lanford, W. A., Water entry into silica glass during slow crack growth, Journal of the American Ceramic Society, vol.74, no.10, p. 2573–6.

Ion Beam Techniques for Low K Materials Characterization

  • H. Bakhru (a1), A. Kumar (a1), T. Kaplan (a1), M. Delarosa (a2), J. Fortin (a2), G.-R. Yang (a2), T.-M. Lu (a2), S. Kim (a2), C. Steinbruchel (a2), X. Tang (a2), J. A. Moore (a2), B. Wang (a2), J. McDonald (a2), S. Nitta (a2), V. Pisupatti (a2), A. Jain (a2), P. Wayner (a2), J. Plawsky (a2), W. Gill (a2) and C. Jin (a3)...

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