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Interdiffusion in Exchange Biased NiFe/IrMn/CoFe Electrode in Magnetic Tunnel Junctions

  • Jay H. Lee (a1), Hee D. Jeong (a1), Il C. Rho (a1), Chong S. Yoon (a1) and Chang K. Kim (a1)...

Abstract

Extent of Mn diffusion to the plasma-oxidized AlOx tunnel barrier of magnetic tunnel junction was examined using Auger Electron Spectroscopy (AES) and X-Ray Photoelectron Spectroscopy (XPS). A magnetic film stack consisting of Ta/AlOx/CoFe/IrMn/NiFe/Ta was deposited with the AlOx layer treated under different plasma oxidation durations. AES depth profiles showed that Mn diffusion to the AlOx/CoFe interface increased with increasing oxidation after annealing at 300°C. XPS analysis indicated that Mn found at the CoFe/AlOx interface in the over-oxidized electrode was in the form of MnO2. Our research suggests that Mn diffusion was accelerated by preferential oxidation of Mn at the CoFe/AlOx interface.

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Interdiffusion in Exchange Biased NiFe/IrMn/CoFe Electrode in Magnetic Tunnel Junctions

  • Jay H. Lee (a1), Hee D. Jeong (a1), Il C. Rho (a1), Chong S. Yoon (a1) and Chang K. Kim (a1)...

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