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In-Situ Study of Ti/TiN Stability under Nitrogen Anneal

Published online by Cambridge University Press:  10 February 2011

P. W. DeHaven ,
K. P. Rodbell  and
L. Gignac
P. W. DeHaven
Affiliation:
IBM Characterization and Analysis Solutions, 1580 Route 52, Hopewell Junction, NY 12533, dehaven@us.ibm.com
K. P. Rodbell
Affiliation:
IBM T.J. Watson Research Center, PO Box 218, Yorktown Heights, NY 106598
L. Gignac
Affiliation:
IBM T.J. Watson Research Center, PO Box 218, Yorktown Heights, NY 106598
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Abstract

The effectiveness of a TiN capping layer to prevent the conversion of α-titantium to titanium nitride when annealed in a nitrogen ambient has been studied over the temperature range 300–700°C using in-situ high temperature diffraction and transmission electron microscopy. Over the time range of interest (four hours), no evidence of Ti reaction was observed at 300°C. At 450°C. nitrogen was found to diffuse into the Ti to form a Ti(N) solid solution. Above 500°C the titanium is transformed to a second phase: however this reaction follows two different kinetic paths, depending on the annealing temperature. Below 600°C. the reaction proceeds in two stages, with the first stage consisting of Ti(N) formation, and the second stage consisting of the conversion of the Ti(N) with a transformation mechanism characteristic of short range diffusion (grain edge nucleation). Above 600°C, a simple linear transformation rate is observed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 564: Symposium N – Advanced Interconnects and Contacts , 1999 , 465
Copyright
Copyright © Materials Research Society 1999

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