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In-Situ Characterization of AlGaAs Layers Grown by Chemical Beam Epitaxy Using Dynamic Optical Reflectivity

Published online by Cambridge University Press:  25 February 2011

John V. Armstrong  and
Trevor Farrell
John V. Armstrong
Affiliation:
Department of Materials Science and Engineering, The University of Liverpool, Liverpool L69 3BX, England
Trevor Farrell
Affiliation:
Department of Materials Science and Engineering, The University of Liverpool, Liverpool L69 3BX, England
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Abstract

Characterization of A1GaAs layers grown in a VG-V80H chemical beam epitaxy chamber was achieved using dynamic optical reflectivity (DOR). The reflectivity for both stationary and rotating substrates was measured using a normal incidence visible laser. The DOR technique was used to measure the complex refractive index and the growth rate of the layer.The composition of the AlGaAs layer was then obtained from the published variation of refractive index with aluminum fraction. Using the refractive indices determined by DOR, good agreement with theory was achieved for the reflectivity trace from a AlGaAss/GaAs superlattice structure.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 263: Symposium F – Mechanisms of Heteroepitaxial Growth , 1992 , 193
Copyright
Copyright © Materials Research Society 1992

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References

REFERENCES

1. Macleod, H.A., App. Opt. 20, 82 (1980).Google Scholar
2. Heavens, O.S., Optical Proterties of Thin Solid Films, (Dover Publications, New York, 1965).Google Scholar
3.Metalorganics supplied by Epichem Ltd., Power Rd., Bromborough, Merseyside, L62 3QF, England.Google Scholar
4. Aspnes, D.E. and Studna, A.A., Phys. Rev. B27, 985 (1983).Google Scholar
5. Panish, M.B. and Casey, H.C. Jr, J. Appl. Phys. 40, 163 (1969).Google Scholar
6. Theeten, J.B., Hottier, F. and Hallais, J., Appl. Phys. Lett. 32, 576 (1978).Google Scholar
7. Farrell, T., Armstrong, J.V. and Kightley, P., Appl. Phys. Lett. 59, 1203 (1991)Google Scholar