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In-Situ Characterisation of Precipitation in AI-Cu thin films

Published online by Cambridge University Press:  10 February 2011

J. P. Lokker
Affiliation:
DIMES Nano Physics and Technology, Delft University of Technology, P.O. Box 5046 2600 GA Delft, The Netherlands.
A. J. Bottger
Affiliation:
Delft University of Technology, Laboratory for Materials Science, Rotterdamseweg 137, 2628 AL Delft The Netherlands.
G. C. A. M. Janssen
Affiliation:
DIMES Nano Physics and Technology, Delft University of Technology, P.O. Box 5046 2600 GA Delft, The Netherlands.
S. Radelaar
Affiliation:
DIMES Nano Physics and Technology, Delft University of Technology, P.O. Box 5046 2600 GA Delft, The Netherlands.
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Abstract

The precipitate formation occurring in Al-Cu thin foils with copper concentrations of either 1.15 at.% or 0.3 at.%, has been studied. In-situ X-ray diffraction analysis and differential scanning calorimetry are applied to determine the phases formed and the enthalpy changes in the same samples. Both X-ray diffraction and differential scanning calorimetry indicate that the precipitation behaviour of thin films (about 500 nm thickness) differs significantly from that of bulk material. In the films studied the precipitation of Al2Cu occurs at a much lower temperature than expected on the basis of the (bulk) phase diagram. Moreover, no intermediate phases are observed prior to Al2Cu precipitation. Also the amount of Cu in solid solution (0.20 at%Cu) observed by electron-probe micro-analysis after slowly cooling from 500°C to room temperature, exceeds the solubility of bulk Al-Cu.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

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References

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