Skip to main content Accessibility help
×
Home

Influence of the annealing atmosphere on solution based zinc oxide thin film transistors

  • C. Busch (a1), R. Theissmann (a1), S. Bubel (a1), G. Schierning (a1) and R. Schmechel (a1)...

Abstract

Zinc oxide layers with a thickness of less than 10 nanometers have been synthesized from an aqueous solution for the application as active layer in thin film transistors. They have been conditioned by applying different oxidizing and reducing atmospheres during an annealing process at a temperature of 125°C. It is shown that the charge carrier mobility and threshold voltage is strongly influenced by the annealing atmosphere. Samples annealed in 10% forming gas (H2 in N2 - reducing atmosphere) show the highest field-effect-mobility of 0.6 cm2V-1s-1, but no saturation of the drain current, due to a high free carrier concentration. Samples treated under oxygen (strongest oxidizing atmosphere) show significantly lower mobilities. Subsequently, the samples have been exposed to synthetic air, with varying exposure times. Samples which have been annealed under hydrogen atmospheres show a pronounced decay of the drain current if exposed to synthetic air, whereas all samples conditioned under hydrogen-free atmospheres are significantly more stable under synthetic air. This enhanced sensitivity against oxygen after hydrogen treatment is attributed to residual hydrogen content in the sample that supports the formation of OH-groups which act as electron acceptors.

Copyright

References

Hide All
1. Görrn, P., Sander, M., Meyer, J., Kroger, M., Becker, E., Johannes, H.H., Kowalsky, W. and Riedl, T., Adv. Mater. 18, 738 (2006).
2. Subramanian, V., Fréchet, J.M.J., Chang, P.C., Huang, D.C., Lee, J.B., Molesa, S.E., Murphy, A.R., Redinger, D.R. and Volkman, S.K., Proceedings of the IEEE, 93, 1330 (2005).
3. Volkman, S.K., Mattis, B.A., Molesa, S.E., Lee, J.B., De La Fuente Vornbrock, A., Bakhishev, T. and Subramanian, V.. in Technical Digest - International Electron Devices Meeting, IEDM. (2004).
4. Sun, B. and Sirringhaus, H., Nano Lett. 5, 2408 (2005).
5. Mechau, N., Bubel, S., Nikolova, D. and Hahn, H., Phys. Status Solidi A 207, 1684 (2010).
6. Meyers, S.T., Anderson, J.T., Hung, C.M., Thompson, J., Wager, J.F. and Keszler, D.A., J. Am. Chem. Soc. 130, 17603 (2008).
7. Fleischhaker, F., Wloka, V. and Hennig, I., J. Mater. Chem. 20, 6622 (2010).
8. Theissmann, R., Bubel, S., Sanlialp, M., Busch, C., Schierning, G. and Schmechel, R., Thin Solid Films, In Press, Accepted Manuscript, (2011).
9. McCluskey, M.D., Jokela, S.J., Zhuravlev, K.K., Simpson, P.J. and Lynn, K.G., Appl. Phys. Lett. 81, 3807 (2002).
10. Van de Walle, C.G., Phys. Rev. Lett. 85, 1012 (2000).
11. Janotti, A. and Van de Walle, C.G., Reports On Progress In Physics. 72, 126501 (2009).
12. Li, Q.H., Liang, Y.X., Wan, Q. and Wang, T.H., Appl. Phys. Lett. 85, 6389 (2004).
13. Fan, Z., Wang, D., Chang, P.-C., Tseng, W.-Y. and Lu, J.G., Appl. Phys. Lett. 85, 5923 (2004).

Keywords

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed