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Influence of Interatomic Potentials in MD Investigation of Ordering in a-SiC

Published online by Cambridge University Press:  21 March 2011

Xianglong Yuan
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, U.S.A.
Linn W. Hobbs
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, U.S.A.
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Abstract

Molecular dynamics (MD) simulations of a-SiC using several Tersoff potentials have been performed and their influences on structure ordering were studied. It was found that using different potential cutoffs leads to remarkably different structures. An abrupt cutoff at 2.5 Å greatly increases the chemical ordering of a-SiC by disfavoring the formation of Si-Si bonds. In addition, annealing of SiC cascades embedded in β-SiC was simulated, and the final structures were compared. Again, much stronger topological and chemical ordering was observed in the structure modeled with the 2.5 Å potential cutoff.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

1. Devanathan, R., Weber, W.J. and Rubia, T. Diaz de la, MRS Proc. 504, 45 (1998).Google Scholar
2. Devanathan, R., Weber, W.J. and Rubia, T. Diaz de la, Nucl. Instr. Meth. B141, 118 (1998).Google Scholar
3. Devanathan, R., Rubia, T. Diaz de la and Weber, W.J., J. Nucl. Mater. 253, 47 (1998).Google Scholar
4. Gao, Fei and Weber, W.J., MRS Proc. 650, this volume (2001).Google Scholar
5. Perlado, J. M., J. Nucl. Mater. 251, 98 (1997).Google Scholar
6. Malerba, L. and Perlado, J.M., J. Nucl. Mater. (in press 2001).Google Scholar
7. Huang, H., Ghoniem, N., Wong, J. and Baskes, M., Mater. Sci. Eng. 3, 615 (1995).Google Scholar
8. Tersoff, J., Phys. Rev. B39, 5566 (1989).Google Scholar
9. Pearson, E. et al. , J. Cryst. Growth 70, 33 (1984).Google Scholar
10. Baskes, M.I., Phys. Rev. B46, 2727 (1992).Google Scholar
11. Tersoff, J., Phys. Rev. Lett. 64, 1757 (1990).Google Scholar
12. Tersoff, J., Phys. Rev. B49, 16349 (1994).Google Scholar
13. Finocchi, F., Galli, G., Parrinello, M. and Bertoni, C.M., Phys. Rev. Lett. 68, 3044 (1992).Google Scholar
14. Gao, Fei, (private communication).Google Scholar
15. Smith, W. and Forester, T.R., http://www.dl.ac.uk/tcsc/software/DL_POLY (accessed 2000).Google Scholar
16. Berendsen, H.J.C., Postma, J.P.M., Gunster, W. van, DiNala, A. and Haak, J.R., J. Chem. Phys. 81, 3684 (1984).Google Scholar
17. Hobbs, L.W. and Yuan, X., in Defects in SiO2 and Related Dielectrics: Science and Technology, edited by Pacchioni, G., Skuja, L. and Griscom, D. L. (Kluwer, Dordrecht, Netherlands, 2000) p. 37.Google Scholar