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In Situ Study of The Exposure of Polycarbonate to an Argon Plasma

Published online by Cambridge University Press:  15 February 2011

S. Vallon ,
B. Drevillon ,
F. Poncin-Epaillard  and
J. C. Rostaing
S. Vallon
Affiliation:
Laboratoire de Physique des Interfaces et des Couches Minces (CNRSJ.UPR 258), Ecole Polytechnique, 91128 Palaiseau, France
B. Drevillon
Affiliation:
Laboratoire de Physique des Interfaces et des Couches Minces (CNRSJ.UPR 258), Ecole Polytechnique, 91128 Palaiseau, France
F. Poncin-Epaillard
Affiliation:
Laboratoire de Chimie et Physicochimie Macromoléculaire (CNRS URA 509), Université du Maine, Avenue Olivier Messiaen, 72017 Le Mans, France
J. C. Rostaing
Affiliation:
L'Air Liquide CRCD, BP 126, 78350 Les-Loges-en-Josas, France
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Abstract

The exposure of polycarbonate to an argon plasma is studied using in situ ellipsometry from the UV to the IR, nuclear magnetic resonance and light scattering measurements. An increase in the refractive index and the existence of two populations of different molecular weights show that structural changes occur in the polymer. They are correlated with modifications at the polymer unit scale, such as formation of new polar groups and decrease in dimethyl groups. Two simultaneous reaction mechanisms must be considered to account for these changes. The adhesion of a silica layer on treated polycarbonate is then discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 385: Symposium N – Polymer/Inorganic Interfaces II , 1995 , 27
Copyright
Copyright © Materials Research Society 1995

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References

REFERENCES

1. Hansen, R.H. and Schonhorn, H., J. Polym. Sci., Polym. Lett. Ed. B 4, 203 (1966).Google Scholar
2. Hollahan, J.R. and Bell, A.T., TechniQues and Applications of Plasma Chemistry (Wiley, New York, 1974).Google Scholar
3. Rostaing, J.C., Coeuret, F., Drévillon, B., Etemadi, R., Godet, C., Huc, J., Parey, J.Y. and Yakovlev, V., Thin Solid Films 236, 58 (1993).Google Scholar
4. Blayo, N. and Drévillon, B., Appl. Phys. Lett. 59, 950 (1991); J. Non-Cryst. Solids 137- 138, 771 (1991).Google Scholar
5. Drévillon, B., Prog. in Cryst. Growth and Charact. of Mat. 27, 1 (1993).Google Scholar
6. Canillas, A., Pascual, E. et Drévillon, B., Rev. Sci. Instr. 64, 2153 (1993).Google Scholar
7. Aspnes, D.E., Thin Solid Films 89, 249 (1982).Google Scholar
8. Rivaton, A., Sallet, D. and Lemaire, J., Polym. Photochem. 3, 463 (1983).Google Scholar
9. Gheorghiu, A. and Sénémaud, C. (private communication).Google Scholar
10. Martinu, L. and Klemberg-Sapieha, J.E. (private communication).Google Scholar