Skip to main content Accessibility help

In Situ Ellipsometric Study of the Dependence of a-Si:H Film Growth on Substrate Properties and Ignition Procedures

  • U.I. Schmidt (a1), W. Herbst (a1), B. Schröder (a1) and H. Oechsner (a1)


In situ ellipsometry reveals that particle formation influences the growth of glow discharge a-Si:H. This particle formation is observed even under discharge conditions leading to the deposition of device quality Material. It is found that less dense material is deposited during the particle-induced initial transient stage of the discharge which influences the properties of the subsequently growing “bulk” film. The effect of special power gradient ignition procedures is discussed. A significant increase of solar cell efficency is achieved by choosing “soft” start conditions for the i-layer deposition.



Hide All
1. Spears, K.G., Robinson, T.J., Roth, R.M., IEEE Trans. Plasma Sci., PS-14, 179 (1986)
2. Schmidt, U.I., Schröder, B., Oechsner, H., Thin Solid Films 233, 297 (1993)
3. Schmidt, U.I., Schröder, B., Oechsner, H., J. Non-Cryst. Solids 164–166, 127 (1993)
4. Aspnes, D.E.. Studna, A.A., Kinsbron, E., Phys. Rev. B, 29, 768 (1984)
5. Collins, R.W. and Pawlowski, A., J. Appl. Phys. 59, 1160 (1986)
6. Canillas, A., Bertrán, E., Andujar, J.L., Drevillon, B., J. App. Phys. 68, 2752 (1990)
Recommend this journal

Email your librarian or administrator to recommend adding this journal to your organisation's collection.

MRS Online Proceedings Library (OPL)
  • ISSN: -
  • EISSN: 1946-4274
  • URL: /core/journals/mrs-online-proceedings-library-archive
Please enter your name
Please enter a valid email address
Who would you like to send this to? *


Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed