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In Situ Ellipsometric Study of the Dependence of a-Si:H Film Growth on Substrate Properties and Ignition Procedures

  • U.I. Schmidt (a1), W. Herbst (a1), B. Schröder (a1) and H. Oechsner (a1)

Abstract

In situ ellipsometry reveals that particle formation influences the growth of glow discharge a-Si:H. This particle formation is observed even under discharge conditions leading to the deposition of device quality Material. It is found that less dense material is deposited during the particle-induced initial transient stage of the discharge which influences the properties of the subsequently growing “bulk” film. The effect of special power gradient ignition procedures is discussed. A significant increase of solar cell efficency is achieved by choosing “soft” start conditions for the i-layer deposition.

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References

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1. Spears, K.G., Robinson, T.J., Roth, R.M., IEEE Trans. Plasma Sci., PS-14, 179 (1986)
2. Schmidt, U.I., Schröder, B., Oechsner, H., Thin Solid Films 233, 297 (1993)
3. Schmidt, U.I., Schröder, B., Oechsner, H., J. Non-Cryst. Solids 164–166, 127 (1993)
4. Aspnes, D.E.. Studna, A.A., Kinsbron, E., Phys. Rev. B, 29, 768 (1984)
5. Collins, R.W. and Pawlowski, A., J. Appl. Phys. 59, 1160 (1986)
6. Canillas, A., Bertrán, E., Andujar, J.L., Drevillon, B., J. App. Phys. 68, 2752 (1990)
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MRS Online Proceedings Library (OPL)
  • ISSN: -
  • EISSN: 1946-4274
  • URL: /core/journals/mrs-online-proceedings-library-archive
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