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In situ and Ex situ Applications of Spectroscopic Ellipsometry

Published online by Cambridge University Press:  22 February 2011

John A. Woollam ,
Blaine Johs ,
William A. McGahan ,
Paul G. Snyder ,
Jeffrey Hale  and
Huade Walter Yao
John A. Woollam
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511, and JA Woollam Co., Inc., 650 J Street, Lincoln, NE 68508 University of Nebraska, Lincoln, NE 68588-0511, and JA Woollam Co., Inc., 650 J Street, Lincoln, NE 68508
Blaine Johs
Affiliation:
University of Nebraska, Lincoln, NE 68588-0511, and JA Woollam Co., Inc., 650 J Street, Lincoln, NE 68508
William A. McGahan
Affiliation:
University of Nebraska, Lincoln, NE 68588-0511, and JA Woollam Co., Inc., 650 J Street, Lincoln, NE 68508
Paul G. Snyder
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511, and JA Woollam Co., Inc., 650 J Street, Lincoln, NE 68508
Jeffrey Hale
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511, and JA Woollam Co., Inc., 650 J Street, Lincoln, NE 68508
Huade Walter Yao
Affiliation:
Center for Microelectronic and Optical Materials Research, and Department of Electrical Engineering, University of Nebraska, Lincoln, NE 68588-0511, and JA Woollam Co., Inc., 650 J Street, Lincoln, NE 68508
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Abstract

We briefly review the optics of ellipsometry, followed by discussions of a series of example applications of the technique including single films on a substrate; multilayer stacks common to silicon integrated circuit fabrication; flat panel display materials, and in situ semiconductor growth and deposition control.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 324: Symposium K – Diagnostic Techniques for Semiconductor Materials Processing , 1993 , 15
Copyright
Copyright © Materials Research Society 1994

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References

1. Azzam, R.M.A. and Bashara, N.M., Ellipsometry and Polarized Light, North Holland Press, Amsterdam, 1977.Google Scholar
2. Hauge, P. S. and Dill, F. H., IBM J. Res. Devel., 17, 472, (1973).Google Scholar
3. Aspnes, D.E. and Studna, A. A., Appl. Optics, 14, 220, (1975).CrossRefGoogle Scholar
4. Jellison, G.E. Jr., Thin Solid Films, 234, 416, (1993).Google Scholar
5. Press, W. H., Flannery, B. P., Teukolsky, S. A., and Vetterling, W. T., Numeric-a Recipes, Cambridge University Press, 1986.Google Scholar
6. Proceedings of First International Conference on Spectroscopic Ellipsometry, edited by Boccara, A. C., Pickering, C., and Rivory, J., Elsevier Sequoia, Amsterdam, 1993.Google Scholar
7. Xiong, Y.M., Snyder, P.G., Woollam, J.A., and Krosche, E. R., J. Vac. Sci. Techn., A10, 950, (1992).CrossRefGoogle Scholar
8. Bu-Abbud, G. H., Bashara, N.M., and Woollam, J.A., Thin Solid Films, 138, 27, (1986).Google Scholar
9. McGahan, W. A., Johs, B., and Woollam, J. A., thin solid Films, 234, 443 (1993)Google Scholar
10. Irene, E. A., Thin solid Films, 233, 96 (1993).Google Scholar
11. Johs, B., Edwards, J. L., Shiralagi, K. T., Droopad, R., Choi, K. Y., Maracas, G. N., Meyer, D., Cooney, G. T., and Woollam, J. A., Mat. Res. Soc. Symp. Proc., 222, 75 (1991).Google Scholar
12. Johs, B., Doerr, D., Pittal, S., Bhat, I. B., Dakshinamurthy, S., Thin Solid Films, 233 293 (1993).Google Scholar
13. Nafis, S., lanno, N. J., Snyder, P. G., McGahan, W. A., Johs, B., and Woollam, J. A., Thin Solid Films, 233, 253 (1993).CrossRefGoogle Scholar