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Homogeneous Al-Ti and Al-Ti-Si Thin Alloy Films

Published online by Cambridge University Press:  26 February 2011

Albertus G. Dirks ,
Tien Tien  and
Janet M. Towner
Albertus G. Dirks
Affiliation:
Philips Research Laboratories Sunnyvale, Signetics Corporation, 811 E. Arques Avenue, Sunnyvale, CA 94088–3409
Tien Tien
Affiliation:
Philips Research Laboratories Sunnyvale, Signetics Corporation, 811 E. Arques Avenue, Sunnyvale, CA 94088–3409
Janet M. Towner
Affiliation:
Philips Research Laboratories Sunnyvale, Signetics Corporation, 811 E. Arques Avenue, Sunnyvale, CA 94088–3409
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Abstract

The microstructure and properties of thin films depends strongly upon the alloy composition. A study was made of the metallurgical aspects of homogeneous Al alloy films, particularly the binary Al-Ti and the ternary Al-Ti-Si systems. Electrical resistivity, grain size morphology, second phase formation and electromigration have been studied as a function of the alloy composition and its heat treatment.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 54: Symposium E – Thin Films–Interfaces and Phenomena , 1985 , 181
Copyright
Copyright © Materials Research Society 1986

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References

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