Hostname: page-component-8448b6f56d-gtxcr Total loading time: 0 Render date: 2024-04-24T23:57:50.079Z Has data issue: false hasContentIssue false

High-Throughput Screening of Flux Materials for Single Crystal Growth by Combinatorial Pulsed Laser Deposition

Published online by Cambridge University Press:  01 February 2011

R. Takahashi
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226–8503, Japan
T. Tanigawa
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226–8503, Japan
Y. Yamamoto
Affiliation:
National Institute of Materials Science, 1–1 Namiki, Tsukuba, Ibaragi, 305–0044, Japan
Y. Yonezawa
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226–8503, Japan Fuji Electric Corporate Research and Development, Ltd, 2–2–1, Nagasaka, Yokohama-city 240–0194, Japan
Y. Matsumoto
Affiliation:
Frontier Collaborative Research Center, Tokyo Institute of Technology, Yokohama 226–8503, Japan
H. Koinuma
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226–8503, Japan National Institute of Materials Science, 1–1 Namiki, Tsukuba, Ibaragi, 305–0044, Japan CREST, Japan Science and Technology Corporation, Japan
Get access

Abstract

We propose a new concept and method for high throughput screening of flux materials used in the bulk single crystal growth. The concept of our tri-phase epitaxy has been generalized as the flux-mediated epitaxy with the aid of quick optimization of flux materials in the combinatorial thin-film technology. Here, we report on the successful discovery of a new flux composition of Bi-Ti-Cu-O for the growth of high-quality Bi4Ti3O12 bulk crystal and thin film.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Wagner, R. S. and Ellis, W. C., Appl. Phys. Lett. 4, 89 (1964)Google Scholar
[2] Yun, K. S., Choi, B. D., Matsumoto, Y., Song, J. H., Kanda, N., Itoh, T., Kawasaki, M., Chikyow, T., Ahmet, P. and Koinuma, H., Appl. Phys. Lett. 80, 61 (2002)Google Scholar
[3] Nakamura, M., Kambara, M., Umeda, T., Shiohara, Y., Physica C, 266, 178 (1996)Google Scholar
[4] Elwell, D. and Scheel, H. J., Crystal Growth from High-Temperature Solutions, Academic Press, Inc., London (1975)Google Scholar
[5] Kawasaki, M., Takahashi, K., Maeda, T., Tsuchiya, R., Shinohara, M., Ishiyama, O., Yonezawa, T., Yoshimoto, M., and Koinuma, H., Science 266, 1540 (1994)Google Scholar
[6] Fukumura, T., Ohtani, M., Kawasaki, M., Okimoto, Y., Kageyama, T., Koida, T., Hasegawa, T., Tokura, Y., Koinuma, H., Appl. Phys. Lett. 77, 3426 (2000)Google Scholar
[7] Takahashi, R., Kubota, H., Murakami, M., Yamamoto, Y., Matsumoto, Y., Koinuma, H., J. Comb. Chem. in pressGoogle Scholar
[8] Ohtani, M., Fukumura, T., Kawasaki, M., Omote, K., Kikuchi, T., Harada, J., Ohtomo, A., Lippmaa, M., Ohnishi, T., Komiyama, D., Takahashi, R., Matsumoto, Y. and Koinuma, H., Appl. Phys. Lett. 79, 3594 (2001)Google Scholar
[9] Matsuda, Y., Matsumoto, H., Baba, A., Goto, T., Hirai, T., Jpn. J. Appl. Phys. 31, 3108 (1992)Google Scholar
[10] Rae, A. D., Thompson, J. G., Withers, R. L. and Willis, A. C., Acta Cryst. B46, 474 (1990)Google Scholar
[11] Takahashi, R. et al, in preparation for publicationGoogle Scholar