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High-Resolution Transmission Electron Microscope Analysis of Tungsten Carbide Thin Films

Published online by Cambridge University Press:  10 February 2011

Wentao Qin
Affiliation:
Physics & Astronomy Department and CME, University of Missouri-StL, St. Louis MO 63121
W. Shih
Affiliation:
Chemistry Department and Materials Research Center, University of Missouri-Rolla, Rolla MO 65409 Brewer Science Inc., Rolla MO 65402
J. Lib
Affiliation:
Chemistry Department and Materials Research Center, University of Missouri-Rolla, Rolla MO 65409 Western Digital Corporation, San Jose CA 95138
W. James
Affiliation:
Western Digital Corporation, San Jose CA 95138
H. Siriwardaneane
Affiliation:
Physics & Astronomy Department and CME, University of Missouri-StL, St. Louis MO 63121 MEMC Electronic Materials Inc., P. O. Box 501, St.Peters MO 63376
P. Fraundorf
Affiliation:
Physics & Astronomy Department and CME, University of Missouri-StL, St. Louis MO 63121
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Abstract

Electron diffraction patterns and high-resolution transmission electron microscope (HREM) images show that the dominant phase in tungsten carbide thin films grown by plasma enhanced chemical vapor deposition is WC(1−x). The f.c.c crystal structure and the unit cell size of WC(1−x) have been determined via electron powder diffraction. The two largest and most dominant spacings in HREM images are the {111} and {002} spacings of WC(1−x). Cross lattice fringes along the two most densely populated zones of WC(1−x) are seen. The sizes and aspect ratios of nano-crystals have been measured from HREM images. Stereo analysis of individual nano-crystals has been done. Confirmation of the 3-D structure of WC(1−x) via spacings larger than 0.15 nm will require a tilt larger than 35° between images.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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References

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