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Hardening Mechanisms of Amorphous / Polycrystalline Nanostructured Multilayer Films: Si3N4/CrN and Si3N4/TiN

Published online by Cambridge University Press:  11 February 2011

Junhua Xu ,
Lihua Yu ,
Yasushi Azuma ,
Koichiro Hattori ,
Toshiyuki Fujimoto  and
Isao Kojima
Junhua Xu
Affiliation:
Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 5, Higashi 1–1, Tsukuba, Ibaraki 305–8565, Japan.
Lihua Yu
Affiliation:
Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 5, Higashi 1–1, Tsukuba, Ibaraki 305–8565, Japan.
Yasushi Azuma
Affiliation:
Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 5, Higashi 1–1, Tsukuba, Ibaraki 305–8565, Japan.
Koichiro Hattori
Affiliation:
Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 5, Higashi 1–1, Tsukuba, Ibaraki 305–8565, Japan.
Toshiyuki Fujimoto
Affiliation:
Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 5, Higashi 1–1, Tsukuba, Ibaraki 305–8565, Japan.
Isao Kojima
Affiliation:
Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 5, Higashi 1–1, Tsukuba, Ibaraki 305–8565, Japan.
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Abstract

The amorphous/polycrystalline Si3N4/CrN and Si3N4/TiN nano-structured multilayer films have been fabricated by RF reactive magnetron sputtering. The microstructure and properties of these films were measured by XRD, HRTEM and nano-indenter There is no superhardness effect in the Si3N4/CrN multilayers. The hardness values of Si3N4/CrN multilayers are between those of the constituent CrN and Si3N4 films at a substrate temperature of 20∼C, and are a little higher than those of Si3N4 films at a deposition temperature of 500°C. However, the superhardness effect was found in Si3N4/ TiN multilayers. The hardness of Si3N4/ TiN multilayers is affected not only by modulation periods, but also by layer thickness ratio and deposition temperature. The maximum hardness value is about 40% higher than the value calculated from the rule of mixtures at a deposition temperature of 500°C and a layer thickness ratio (lSi3N4/ lTiN) of 3 / 1. Based on experimental results, the hardening mechanisms in these multilayers have been discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 750: Symposium Y – Surface Engineering 2002–Synthesis, Characterization and Applications , 2002 , Y5.7
Copyright
Copyright © Materials Research Society 2003

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References

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