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Hard X-ray beam damage study of monolayer Ni islands using SX-STM

  • Nozomi Shirato (a1), Marvin Cummings (a1), Heath Kersell (a2), Yang Li (a2), Dean Miller (a3), Daniel Rosenmann (a3), Saw-Wai Hla (a2) (a3) and Volker Rose (a1) (a3)...

Abstract

X-ray beam-induced damage in nanoscale metal islands was investigated. Monolayer-high Ni islands were prepared on a Cu(111) substrate. High brilliance X-rays with photon energies between 8.45 and 8.85 keV illuminated the sample for about 11 hours. In order to track changes in the morphology of the islands, the synchrotron X-ray scanning tunneling microscopy (SX-STM) technique was utilized. The result shows that X-ray illumination onto Ni islands does not induce noticeable damage. The study demonstrates that local beam-induced changes can be studied using SX-STM.

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Corresponding author

*Corresponding authors: (N.S.) nshirato@anl.gov
**(V.R.) vrose@anl.gov

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Hard X-ray beam damage study of monolayer Ni islands using SX-STM

  • Nozomi Shirato (a1), Marvin Cummings (a1), Heath Kersell (a2), Yang Li (a2), Dean Miller (a3), Daniel Rosenmann (a3), Saw-Wai Hla (a2) (a3) and Volker Rose (a1) (a3)...

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