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Gas Phase Reactions in Horizontal MOCVD Reactors

Published online by Cambridge University Press:  25 February 2011

Hitoshi Tanaka  and
J. Komeno
Hitoshi Tanaka
Affiliation:
Fujitsu Laboratories Ltd., 10–1 Morinosato-Wakamiya, Atsugi 243–01, Japan
J. Komeno
Affiliation:
Fujitsu Laboratories Ltd., 10–1 Morinosato-Wakamiya, Atsugi 243–01, Japan
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Abstract

We have applied kinetic simulation to MOCVD chemistry in a horizontal MOCVD reactor. Both chemical reactions and material diffusion are considered. For trimethylgallium decomposition, concentrations of chemical species reach their steady state values which differ largely from the equilibrium values.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 94: Symposium D – Initial Stages of Epitaxial Growth , 1987 , 255
Copyright
Copyright © Materials Research Society 1987

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References

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