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Formation of Porous Silicon Layers on Insulating Substrate for Microbridge – Type Sensor Applications

Published online by Cambridge University Press:  01 February 2011

Sergey Ya. Andrushin
Affiliation:
Institute of Rare Metals, B. Tolmachevsky 5, Moscow, 109017, Russia
Leonid A. Balagurov
Affiliation:
Institute of Rare Metals, B. Tolmachevsky 5, Moscow, 109017, Russia
Sue C. Bayliss
Affiliation:
Faculty of Health and Life Sciences, De Montfort University, Leicester, LE1 9BH, UK
Galina V. Liberova
Affiliation:
Institute of Rare Metals, B. Tolmachevsky 5, Moscow, 109017, Russia
Elena A. Petrova
Affiliation:
Institute of Rare Metals, B. Tolmachevsky 5, Moscow, 109017, Russia
Bayram Unal
Affiliation:
Faculty of Health and Life Sciences, De Montfort University, Leicester, LE1 9BH, UK
Dmitrii G. Yarkin
Affiliation:
Institute of Rare Metals, B. Tolmachevsky 5, Moscow, 109017, Russia
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Abstract

Formation processes of porous silicon on insulating substrate were studied. It was demonstrated that both electrochemical and chemical formation methods allow to transform heavily doped p-type polycrystalline silicon into homogeneous porous silicon. Porous silicon was successfully used as sacrificial layer in the fabrication process of microbridge structures.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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References

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