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Formation Of Hydrogen Molecules In Crystalline Silicon Treated With Atomic Hydrogen

Published online by Cambridge University Press:  15 February 2011

K. Murakami
Affiliation:
Institute of Materials Science, University of Tsukuba, Tennoudai 1–1–1, Tsukuba, Ibaraki 305, Japan; murakami@mat. ims.tsukuba.ac.jp
N. Fukata
Affiliation:
Institute of Materials Science, University of Tsukuba, Tennoudai 1–1–1, Tsukuba, Ibaraki 305, Japan; murakami@mat. ims.tsukuba.ac.jp
S. Sasaki
Affiliation:
Institute of Materials Science, University of Tsukuba, Tennoudai 1–1–1, Tsukuba, Ibaraki 305, Japan; murakami@mat. ims.tsukuba.ac.jp
K. Ishioka
Affiliation:
National Research Institute for Metals, Sengen 1–2–1, Tsukuba, Ibaraki 305, Japan;
K. G. Nakamura
Affiliation:
National Research Institute for Metals, Sengen 1–2–1, Tsukuba, Ibaraki 305, Japan;
M. Kitajima
Affiliation:
National Research Institute for Metals, Sengen 1–2–1, Tsukuba, Ibaraki 305, Japan;
S. Fujimura
Affiliation:
Process Development Division, Fujitsu Ltd., Kawasaki, Kanagawa 211, Japan;
J. Kikuchi
Affiliation:
Process Development Division, Fujitsu Ltd., Kawasaki, Kanagawa 211, Japan;
H. Haneda
Affiliation:
National Institute for Research in Inorganic Materials, Namiki 1–1, Tsukuba, Ibaraki 305, Japan
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Abstract

Hydrogen molecules have been formed in crystalline silicon at various temperatures by a hydrogen-atom remote treatment. The Raman spectrum of the vibrational lines of hydrogen molecules in crystalline silicon is detected for silicon samples treated at temperatures between 250 and 500° C. The maximum production is obtained at 400° C. The Raman spectrum of hydrogen molecules in silicon observed at room temperature exhibits a frequency shift of around 4158 cm−1 and a very broad half-width of approximately 34 cm−1. Isotope shift also can be observed at around 2990 cm−1 in silicon treated with deuterium atoms at 400° C. The frequency shifts of the observed lines are in close agreement with those reported for molecular hydrogen and deuterium in gas, liquid, and solid phases. We discuss a model for the hydrogen molecule configuration and rule out the possibility of high-pressure hydrogen molecular gas in microvoids in crystalline silicon. These results indicate that hydrogen molecules exist at the tetrahedral interstitial sites in crystalline silicon.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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