Skip to main content Accessibility help

Faceting of Single-Crystal SrTiO3 During Wet Chemical Etching

  • G. C. Spalding (a1), W. L. Murphy (a1), T. M. Davidsmeier (a1) and J. E. Elenewski (a1)


We use an Atomic Force Microscope (AFM) to study changes in the surface of single-crystal SrTiO3 etched in HF-based solutions. Attention in this work has been focused upon observations of pyramidal pitting – both because of an interest in avoiding etch pits during substrate preparation prior to heteroepitaxial growth, and because of an interest in micromachining this highly polarizable material. We note that (110) SrTiO3 is surprisingly robust against the formation of pits, while pitting is significant on {100} surfaces. Particular etch rates have been measured, and we discuss anisotropies in the rates of dissolution. These data are combined to extract a macroscopic model describing processes relevant to the most extreme pitting, which we show to be associated with surface defects.



Hide All
1. Achutharaman, V.S., Beauchamp, K.M., Chandrasekhar, N., Spalding, G.C., Johnson, B.R., Goldman, A.M., Thin Solid Films 216, 14 (1992).
2. Achutharaman, V.S., Kraus, P., Vas'ko, V., Nordman, C., Goldman, A.M., Appl. Phys. Lett. 67, 1019 (1995); V.A. Vas'ko, C.A. Nordman, P.A. Kraus, V.S. Achutharaman, A.R. Ruosi, A.M. Goldman Appl. Phys. Lett. 68, 2571 (1996).
3. Kawasaki, Masashi, Takahashi, Kazuhiro, Maeda, Tatsuro, Tsuchiya, Ryuto, Shinohara, Makoto, Ishiyama, Osamu, Yonezawa, Takuzo, Yoshimoto, Mamoru, Koinuma, Hideomi, Science 266, 1540 (1994).
4. Polli, Andrew D., Wagner, Thomas, Rühle, Manfred, Surf. Sci. 429, 237 (1999).
5. Koster, Gertjan, Kropman, Boike L., Guus, J. H. Rijnders, M., Dave, H. Blank, A., Rogalla, Horst, Appl. Phys. Lett. 73, 2920 (1998).
6. Barabasi, Albert-Laszlo Stanley, H. Eugene, Fractal Concepts in Surface Growth (Cambridge Univ. Pr., 1995).
7. Rhodes, W. H., J. Am. Ceram. Soc. 49, 110 (1966)
8. Spalding, G. C., Murphy, W. L., Davidsmeier, T., APS Bulletin 43, 623 (1998).
9. Elenewski, J. E. and Spalding, G. C.,∼gspaldin/stitch.html
10. Bean, Kenneth E., IEEE Trans. El. Dev. ED-25, 1185 (1978).
11. Elwenspoek, M., J. Electrochem. Soc. 140, 2075 (1993); Silicon Micromachining (Cambridge Univ. Pr., 1999), pp. 45-64.
12. Flidr, J., Huang, Y.C., Newton, T.A., Hines, M.A., J. Chem. Phys. 108, 5542 (1998).
13. Heimann, Robert B., Crystals, vol. 8 (Springer-Verlag, 1982), p. 173224.
14. Sangwal, K., Etching of Crystals (North-Holland, 1987).
15. Haase, Rolf, Thermodynamics of Irreversible Processes (Dover, 1990), p. 39.
16. Blakemore, J.S., Solid State Physics, 2nd ed. (Saunders, 1974), p. 80.

Faceting of Single-Crystal SrTiO3 During Wet Chemical Etching

  • G. C. Spalding (a1), W. L. Murphy (a1), T. M. Davidsmeier (a1) and J. E. Elenewski (a1)


Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed