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Fabrication of W/C Multilayers by Direct Ion Beam Deposition

Published online by Cambridge University Press:  22 February 2011

K. Ito
Affiliation:
Central Research laboratory, Japan Aviation Electronics Industry, Ltd., 1-1, Musashino 3-chome, Akishima-shi, Tokyo, 196, Japan
K. Nishimoto
Affiliation:
Central Research laboratory, Japan Aviation Electronics Industry, Ltd., 1-1, Musashino 3-chome, Akishima-shi, Tokyo, 196, Japan
K. Watanabe
Affiliation:
Central Research laboratory, Japan Aviation Electronics Industry, Ltd., 1-1, Musashino 3-chome, Akishima-shi, Tokyo, 196, Japan
I. Kataoka
Affiliation:
Central Research laboratory, Japan Aviation Electronics Industry, Ltd., 1-1, Musashino 3-chome, Akishima-shi, Tokyo, 196, Japan
Frédéric Widmann
Affiliation:
Present Address: Université Louis Pasteur, Ecole Nationale Supérieure de Physique de Strasbourg, 7-ruede 1’université, 67000, Strasbourg, France
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Abstract

The multilayer structures of tungsten and carbon for soft x-ray mirrors were fabricated by the low energy (<100eV) direct ion beam deposition method with various depositing ion energies. The layered structures were observed by cross sectional TEM. The undulated structures were found in the layered structures of the depositing ion energy of 6OeV and lOOeV. It becomes larger as the depositing ion energy increases, and the undulation of the upper layers was larger than that of the under layers. The undulation seems to increase in each carbon layer. These results are quite different from the results of evaluation of thick monolayer films in the previous work. Then, the interfacial composite layer was evaluated by XPS. The tungsten carbide layer was found at the W/ C interface on the C layer. However, we can not find such layer at the interface on the W layer. This result can be explained by the difference of the momentum of the depositing ion.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

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