Hostname: page-component-76fb5796d-22dnz Total loading time: 0 Render date: 2024-04-27T01:57:45.095Z Has data issue: false hasContentIssue false

Excitation Time Dependence of Luminescence Decay in Thermally Oxidized Porous Si

Published online by Cambridge University Press:  28 February 2011

K. Shiba
Affiliation:
Department of Electrical Engineering, Hiroshima University Higashi-Hiroshima 724, Japan
S. Miyazaki
Affiliation:
Department of Electrical Engineering, Hiroshima University Higashi-Hiroshima 724, Japan
M. Hirose
Affiliation:
Department of Electrical Engineering, Hiroshima University Higashi-Hiroshima 724, Japan
Get access

Abstract

Thermally oxidized porous silicon shows stable visible luminescence under laser irradiation. The photoluminescence decay has been measured in the temporal range from microsecond to millisecond. The decay curve is well fitted to a stretched exponential function. The mean lifetime of the luminescence increases with increasing the excitation pulse width. It is also found that the higher energy emission exhibits a faster decay compared with the lower energy emission at 293K, while at 18K it is reversed. The results are explained by a model in which photogenerated carriers are captured by localized radiative centers through a thermally assisted tunneling mechanism

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Canham, L. T., Appl. Phys. Lett. 57, 1046 (1990).Google Scholar
2 Lehmann, V. and Gösele, U., Appl. Phys. Lett. 58, 856 (1991).Google Scholar
3 Koshida, N. and Koyama, H., Jpn. J. Appl. Phys. 30, L1221 (1991).Google Scholar
4 Motohiro, T., Kachi, T., Miura, F., Takeda, Y., Hyodo, S. and Noda, S. in Light Emission from Silicon, edited by Iyer, S. S., Collins, R. T. and Canham, L. T. (Mater. Res. Soc. Proc. 256, Pittsburgh, PA, 1992) pp. 5358.Google Scholar
5 Brandt, M. S., Fuchs, H. D., Stutzmann, M., Weber, J. and Cardona, M., Solid State Commun. 81, 307 (1992).Google Scholar
6 Koch, F., in Silicon-Based Optoelectronic Materials, edited by Tischler, M. A., Collins, R. T., Thewalt, M. L. W. and Abstreiter, G. (Mat. Res. Soc. Proc. 298, Pittsburgh, PA, 1993) pp. 319329.Google Scholar
7 Tischler, M. A., Collins, R. T., Stathis, J. H. and Tsang, J. C., Appl. Phys. Lett. 60, 639 (1992).Google Scholar
8 Miyazaki, S., Sakamoto, K., Shiba, K. and Hirose, M. in Microcrystalline Semiconductors: Materials Science & Devices, edited by Fauchet, P. M., Tsai, C. C., Canham, L. T., Shimizu, I. and Aoyagi, Y (Mat. Res. Soc. Proc. 283, Pittsburgh, PA, 1993) pp. 299304.Google Scholar
9 Yamada, M. and Kondo, K., Jpn. J. Appl. Phys. 31, L993 (1992).Google Scholar
10 V, Petrova-Koch, Muschik, T., Kux, A., Meyer, B. K. and Koch, F., Appl. Phys. Lett. 61, 943 (1992).Google Scholar
11 Shiba, K., Sakamoto, K., Miyazaki, S. and Hirose, M., Jpn. J. Appl. Phys. 32 2722 (1993).Google Scholar
12 Xie, Y H., Wilson, W. L., Ross, F. M., Mucha, J. A., Fitzgerald, E. A., Macaulay, J. M. and Harris, T. D., J. Appl. Phys. 71, 2403 (1992).Google Scholar
13 Chen, X., Henderson, B. and O’Donnell, K. P., Appl. Phys. Lett. 60 2672 (1992).Google Scholar
14 Ookubo, N., Ono, H., Ochiai, Y. Mochizuki, Y. and Matsui, S., Appl. Phys. Lett 61 940 (1992).Google Scholar
15 Matsumoto, T., Futagi, T., Mimura, H. and Kanemitsu, Y, Phys.Rev. B 47, 13876 (1994).Google Scholar
16 Murayama, K., Miyazaki, S. and Hirose, M., Proc. of 22nd International Conference on the Physics of Semiconductors, (1994), to be published.Google Scholar
17 Kanemitsu, Y, Ogawa, T., Shiraishi, K. and Takeda, K., Phys. Rev. B 48, 4883 (1994).Google Scholar
18 Street, R. A., in Semiconductors and Semimetals 21B, edited by Pankove, J. I. (Academic Press, Orlando, 1984), p. 202.Google Scholar
19 Read, A. J., Needs, R. J., Nash, K. J., Canham, L. T., Calcott, P. D. J. and Qteish, A., Phys. Rev. Lett. 69, 1232 (1992).Google Scholar