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Excimer Laser Irradiation of Metallic Films on Ceramic Substrates

Published online by Cambridge University Press:  28 February 2011

M. J. Godbole
Affiliation:
Department of Materials Science and Engineering, The University of Tennessee, Knoxville, TN 37996–2200
A. J. Pedraza
Affiliation:
Department of Materials Science and Engineering, The University of Tennessee, Knoxville, TN 37996–2200
D. H. Lowndes
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 3783–6118
J. R. Thompson Jr
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 3783–6118 Department of Physics and Astronomy, The University of Tennessee, Knoxville, TN 37996–1200
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Abstract

Copper films sputter deposited on mechanically polished (optical finish) and on annealed substrates were laser-irradiated at various energy densities. The effect of the substrate condition on both the evaporation threshold and the morphology of the laser-irradiated metallic films was investigated. The energy density threshold for laser-induced evaporation of the copper films was studied using energy dispersive x-ray spectroscopy (EDS) in a scanning electron microscope (SEM). It was found that for annealed substrates the energy density threshold decreases relative to the threshold for the as-polished condition. These results are compared with predictions of a mathematical model that assumes that the near surface region of the as-polished ceramic is a highly damaged region and, thus, constitutes a thermal barrier. The film remains intact and with almost no change in morphology after laser irradiation at energy densities lower than 0.80 J/cm2 if the substrate has been previously annealed. On the other hand, copper films deposited on as-polished substrates break up during laser processing forming copper islands.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

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