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Etching of Polymers by Photo-Material Processing using an Excimer Lamp

Published online by Cambridge University Press:  10 February 2011

Noritaka Takezoe
Affiliation:
Department of Electrical and Electronic Engineering, Faculty of Engineering, Miyazaki University, 1–1, Gakuenkibanadai Nishi, Miyazaki, 889–21, Japan.
Atsushi Yokotani
Affiliation:
Department of Electrical and Electronic Engineering, Faculty of Engineering, Miyazaki University, 1–1, Gakuenkibanadai Nishi, Miyazaki, 889–21, Japan.
Kou Kurosawa
Affiliation:
Department of Electrical and Electronic Engineering, Faculty of Engineering, Miyazaki University, 1–1, Gakuenkibanadai Nishi, Miyazaki, 889–21, Japan.
Wataru Sasaki
Affiliation:
Department of Electrical and Electronic Engineering, Faculty of Engineering, Miyazaki University, 1–1, Gakuenkibanadai Nishi, Miyazaki, 889–21, Japan.
Kunio Yoshida
Affiliation:
Department of Electronic Engineering, Osaka Institute of Technology, 5–16–1, Omiya, Asahi-Ku, Osaka, 535, Japan.
Tatsushi Igarashi
Affiliation:
Research and Development Center, USIO Inc., 1194, Sazuchi, Bessho-Cho, Himeji, 671–02, Japan.
Hiromitsu Matsuno
Affiliation:
Research and Development Center, USIO Inc., 1194, Sazuchi, Bessho-Cho, Himeji, 671–02, Japan.
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Abstract

An excimer lamp is a new light source which can produce shorter wavelength of vacuum ultraviolet radiation than conventional ArF excimer lasers. We have tried to use the excimer lamp for photo-etching of polymers such as polymethylmetacrylie and polyimidic resins. We have found that the etching process was including the chemical and the quantumn processes. We also applied this technique for etching of some single crystalline organic materials which were very important to opt-electronic applications.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

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