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Electromagnetically-Induced Surface Microstructures and Enhanced Field Effects in Laser Processing*

Published online by Cambridge University Press:  21 February 2011

S. R. J. Brueck ,
D. J. Ehrlich ,
D. V. Murphy  and
J. Y. Tsao
S. R. J. Brueck
Affiliation:
Lincoln Laboratory, Massachusetts Institute of TechnologyLexington, Massachusetts 02173
D. J. Ehrlich
Affiliation:
Lincoln Laboratory, Massachusetts Institute of TechnologyLexington, Massachusetts 02173
D. V. Murphy
Affiliation:
Lincoln Laboratory, Massachusetts Institute of TechnologyLexington, Massachusetts 02173
J. Y. Tsao
Affiliation:
Lincoln Laboratory, Massachusetts Institute of TechnologyLexington, Massachusetts 02173
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Abstract

The presence of microstructures on surfaces undergoing laser processing modifies the electromagnetic boundary conditions and can lead to dramatic changes in the intensity of the local electromagnetic fields and hence in the reaction rates and final morphologies resulting from the laser reaction. Examples are presented for periodic structures on planar surfaces — the rippling of Ag surfaces during laser oxidation; and for isolated dielectric structures — enhanced scattering (∼ 100x) due to dipolar resonances in Si particles.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 29: Symposium I – Laser-Controlled Chemical Processing of Surfaces , 1983 , 295
Copyright
Copyright © Materials Research Society 1984

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Footnotes

*

This work was supported by the Department of the Air Force, in part with specific support from the Air Force Office of Scientific Research, by the Defense Advanced Research Projects Agency, and by the Army Research Office.

References

REFERENCES

1. Brueck, S. R. J. and Ehrlich, D. J., Phys. Rev. Lett. 48, 1678 (1982).CrossRefGoogle Scholar
2. Ehrlich, D. J., Brueck, S. R. J. and Tsao, J. Y., Appl. Phys. Lett. 41, 630 (1982).Google Scholar
3. See, for example, Chang, R. K. and Furtak, T. K., eds., Surface Enhanced Raman Scattering, (Plenum, New York, 1982).Google Scholar
4. Murphy, D. V. and Brueck, S. R. J. in Laser Diagnostics and Photochemical Processing for Semiconductor Devices, Osgood, R. M., Brueck, S. R. J. and Schlossberg, H. R., eds. (North-Holland, New York, 1983) pp 81–94.Google Scholar
5. Murphy, D. V. and Brueck, S. R. J., Optics Lett. 8, 494 (1983).Google Scholar
6. Johnson, P. B. and Christy, R. W., Phys. Rev. B 6, 4370 (1972).Google Scholar
7. Sipe, J. E., Preston, J. S. and Von Driel, H. M., Phys. Rev. B 27, 1141 (1983).Google Scholar
8. Brueck, S. R. J., Ehrlich, D. J. and Tsao, J. Y. (to be published).Google Scholar
9. Rosasco, G. J. and Bennett, H. S., J. Opt. Soc. Am. 68, 1242 (1978).Google Scholar
10. Chylek, P., Kiehl, J. T. and Ko, M. K. W., Appl. Opt. 17, 3019 (1978).Google Scholar
11. Ashkin, A. and Dziedzic, J. M., Phys. Rev. Lett. 38, 1351 (1977).Google Scholar
12. Chew, H. and Wang, D.-S., Phys. Rev. Lett. 49, 490 (1982).Google Scholar
13. Chang, R. K., Owen, J. F., Barber, P. W., Messinger, B. J., and Brenner, R. E., J. Raman Spectrosc. 10, 178 (1981).Google Scholar
14. Geis, M. W., Smith, H. I., Tsaur, B-Y., Fan, J. C. C., Silversmith, D. J. and Mountain, R. W., J. Electrochem. Soc. 129, 2812 (1982)Google Scholar