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Electrodeposited WO3 Thin Films

Published online by Cambridge University Press:  10 February 2011

E. A. Meulenkamp ,
R. J. J. de Groot  and
J. M. L. de Vries
E. A. Meulenkamp
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4 (WA 13), 5656 AA Eindhoven, The Netherlands, meulenka@natlab.research.philips.com
R. J. J. de Groot
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4 (WA 13), 5656 AA Eindhoven, The Netherlands, meulenka@natlab.research.philips.com
J. M. L. de Vries
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4 (WA 13), 5656 AA Eindhoven, The Netherlands, meulenka@natlab.research.philips.com
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Abstract

The electrodeposition of WO3 thin films from peroxy-tungstate solution is discussed. The emphasis is on the feasibility of this deposition technique for production of electrochromic devices. Therefore, the influence of deposition parameters (solution composition, electrodeposition potential, mass transport, etc.) on the properties of WO3 was studied. Furthermore, it was investigated whether electrodeposition of WO3 offers unique possibilities as compared to WO3 deposition by other techniques.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 451: Symposium P – Electrochemical Synthesis and Modification , 1996 , 321
Copyright
Copyright © Materials Research Society 1997

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References

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