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The Effects of Residual Stress on Modulus Measurements by Indentation

Published online by Cambridge University Press:  10 February 2011

D. F. Bahr ,
D. A. Crowson ,
J. S. Robach  and
W. W. Gerberich
D. F. Bahr
Affiliation:
Mechanical and Materials Engineering, Washington State University, Pullman, WA 99164
D. A. Crowson
Affiliation:
Nanomechanics Research Laboratory, Hysitron, Inc., Minneapolis, MN 55413
J. S. Robach
Affiliation:
Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455
W. W. Gerberich
Affiliation:
Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455
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Abstract

Continuous indentation has been used to evaluate the mechanical response of chromium and platinum films deposited on silicon and glass substrates. The traditional method of analysis of indentation data to determine modulus and hardness is sensitive to residual stress in the film, thereby suggesting that modulus measurements may be used to gauge residual stresses. Evaporated metal films, which are under residual tension, tend to show a lower modulus (using standard calculation methods) than the bulk materials. However, a sputtered platinum film exhibits an apparently higher modulus than the bulk material. These data suggest that differences between the calculated and expected modulus using indentation tests cannot be used to unequivocally determine the stress state in a thin film.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 505 , 1997 , 85
Copyright
Copyright © Materials Research Society 1998

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References

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