Hostname: page-component-76fb5796d-9pm4c Total loading time: 0 Render date: 2024-04-27T04:03:32.315Z Has data issue: false hasContentIssue false

Effects of Deposition Angle on the Optical Properties of Helically Structured Films

Published online by Cambridge University Press:  01 February 2011

Jason B. Sorge
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta Edmonton, Alberta, T6G 2V4, Canada
Andy C. van Popta
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta Edmonton, Alberta, T6G 2V4, Canada
Jeremy C. Sit
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta Edmonton, Alberta, T6G 2V4, Canada
Michael J. Brett
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta Edmonton, Alberta, T6G 2V4, Canada
Get access

Abstract

Glancing-angle deposition (GLAD) is a fabrication method capable of producing thin films with variable porosity. The GLAD process exploits substrate shadowing and limited adatom diffusion to create isolated columns of material that collectively comprise a highly porous thin film. GLAD can be used to create chiral or helical structures with a wide range of porosity through variation of the substrate tilt angle and controlled substrate rotation. We present the effect of the deposition angle on the selective transmittance of circularly polarized light in helical thin films fabricated with the GLAD process. Transmission measurements of titanium dioxide helical films reveal two regimes of enhanced selective transmittance: one corresponding to a substrate tilt angle that produces a maximum circular birefringence and another corresponding to strong anisotropic scattering.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Robbie, K., Brett, M.J., and Lakhtakia, A, J. Vac. Sci. Technol., A 13, 2991 (1995).Google Scholar
2. Robbie, K., Brett, M.J., and Lakhtakia, A, Nature, 384, 616 (1996).Google Scholar
3. Robbie, K., and Brett, M.J., J. Vac. Sci. Technol., A 15, 1460 (1997).Google Scholar
4. Kennedy, S.R., Brett, M.J., Toader, O., and John, S., Nano Lett., 2, 59 (2002).Google Scholar
5. Vick, D., Tsui, Y.Y., Brett, M.J., and Fedosejevs, R., Thin Solid Films, 350, 49 (1999).Google Scholar
6. Sit, J.C., Vick, D., Robbie, K., and Brett, M.J., J. Mater. Res., 14, 1197 (1999).Google Scholar
7. Harris, K.D., Huizinga, A., and Brett, M.J., Electrochem. Solid-State Lett., 5, H27 (2002).Google Scholar
8. Steele, J.J., Harris, K.D., and Brett, M.J., Mat. Res. Soc. Symp. Proc., 788, L11.4.1 (2004).Google Scholar
9. Harris, K.D., Vick, D., Gonzalez, E.J., Smy, T., Robbie, K., and Brett, M.J., Surface & Coatings Technol., 138, 185 (2001).Google Scholar
10. Kennedy, S.R., Brett, M.J., Miguez, H., Toader, O., and John, S., Photonics and Nanostructures., 1, 37 (2003).Google Scholar
11. van Popta, A.C., Hawkeye, M.H., Sit, J.C., Brett, M.J., Opt. Lett., 29, 2545 (2004).Google Scholar
12. Kaminska, K., Brown, T., Beydaghyan, G., and Robbie, K., Appl. Opt., 42, 4212 (2003).Google Scholar
13. Kennedy, S.R., and Brett, M.J., Appl. Opt., 42, 4573 (2003).Google Scholar
14. Hodgkinson, I., and Wu, Q., Advanced Materials, 13, 889 (2001).Google Scholar
15. Hodgkinson, I., Wu, Q., and Collett, S., Appl. Opt., 40, 452 (2001).Google Scholar