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Effects of Annealing on The Structure of Ta2N Thin Films Deposited on Al2O3

Published online by Cambridge University Press:  15 February 2011

James E. Angelo ,
N.R. Moody ,
S.K. Venkataraman  and
W.W. Gerberich
James E. Angelo
Affiliation:
Materials & Process Research Department, Sandia National Laboratories, Livermore, CA 94551-0969
N.R. Moody
Affiliation:
Materials & Process Research Department, Sandia National Laboratories, Livermore, CA 94551-0969
S.K. Venkataraman
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455
W.W. Gerberich
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455
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Abstract

The microstructure of Ta2N thin films deposited by d.c. magnetron sputtering on (1120) surface of Al2O3 is investigated using transmission electron microscopy. The effects of exposing the thin film structure to a 600°C air environment are also explored. It will be shown that under the standard deposition conditions, stresses exist in the thin film structure which leads to the formation of a textured structure in the as-deposited Ta2N. Exposure of the thin film structure to an air environment transforms the Ta2N to Ta2O5 in the orthorhombic structure. In addition, evidence for a epitaxial relationship between the Ta2O5 and Al2O3 will be presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 357: Symposium C – Structure and Properties of Interfaces in Ceramics , 1994 , 195
Copyright
Copyright © Materials Research Society 1995

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References

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