Hostname: page-component-8448b6f56d-sxzjt Total loading time: 0 Render date: 2024-04-24T22:35:09.095Z Has data issue: false hasContentIssue false
  • English
  • Français

The Effect of Thin Dielectric Films on the Accuracy of Pyrometric Temperature Measurement

Published online by Cambridge University Press:  26 February 2011

D. W. Pettibone ,
J. R. Suarez  and
A. Gat
D. W. Pettibone
Affiliation:
AG Associates, Sunnyvale CA
J. R. Suarez
Affiliation:
AG Associates, Sunnyvale CA
A. Gat
Affiliation:
AG Associates, Sunnyvale CA
Get access

Abstract

Pyrometers are used to measure wafer temperature in rapid thermal processors. This paper focuses on the effect of thin dielectric films on the accuracy of pyrometric temperature measurement. The thin films affect the emissivity of the wafer, which in turn affects the radiation emitted by the wafer. Wafers with different oxide thicknesses were monitored by both pyrometer and thermocouple. Temperature errors of the order of 10°C to 50°C were found for wafers of differing oxide thicknesses. The chamber reflectivity was found to be an important factor in determining the ‘effective’ emissivity of the wafer. Pyrometer recalibration is necessary to accurately measure wafer temperature.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 52: Symposium B – Rapid Thermal Processing , 1985 , 209
Copyright
Copyright © Materials Research Society 1986

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Snell, Jay F., in Handbook of Optics, edited by Driscoll, Walter G. and Vaughan, William, (McGraw-Hill, New York 1978), pp 1–13.Google Scholar
2. Sato, T., JJAP. 6 (3), 339 (1967).Google Scholar
3. Ramo, Simon, Whinnery, John R., and Duzer, Theodore Van, Fields and Waves in Communication Electronics, (John Wiley & Sons, New York, 1967), pp 23–58.Google Scholar