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Effect of Surface Roughness on Surface Photochemistry

Published online by Cambridge University Press:  21 February 2011

Kari B. Myli  and
Vicki H. Grassian
Kari B. Myli
Affiliation:
Department of Chemistry, University of Iowa, Iowa City, IA 52242
Vicki H. Grassian
Affiliation:
Department of Chemistry, University of Iowa, Iowa City, IA 52242
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Abstract

Photoinduced processes on surfaces is of fundamental importance in materials processing. For example, photo-assisted chemical vapor deposition has been used to deposit a number of different materials on solid substrates. The effect of substrate morphology on photoinduced processes can be an important factor in film growth. In order to clarify the role of substrate morphology, in particular surface roughness, on surface photochemistry, we have examined the wavelength dependence of the photodissociation of chlorobenzene and 3-chloropyridine adsorbed on smooth and rough silver surfaces. As discussed below, we have measured a red shift in the photodissociation threshold for these molecules adsorbed on a rough surface relative to a smooth surface. The wavelength dependence of the photodissociation cross-section near the threshold has been measured in order to discern the origin of the red shift.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 354: Symposium A – Beam Solid Interactions for Materials Synthesis and Characterization , 1994 , 555
Copyright
Copyright © Materials Research Society 1995

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