Hostname: page-component-7bb8b95d7b-s9k8s Total loading time: 0 Render date: 2024-09-11T19:33:17.949Z Has data issue: false hasContentIssue false

Effect of Nitrous Oxide Gas on Cvd Diamond Film Deposition

Published online by Cambridge University Press:  28 February 2011

H. Koinuma
Affiliation:
Research Laboratory of Engineering Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, 227Japan
M. Yoshimoto
Affiliation:
Research Laboratory of Engineering Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, 227Japan
Y. Takagi
Affiliation:
Research Laboratory of Engineering Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, 227Japan
A. B. Sawaoka
Affiliation:
Research Laboratory of Engineering Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, 227Japan
T. HaHashimoto
Affiliation:
Department of Industrial Chemistry, Faculty of Engineering, Tokyo University, 7–3–1 Hongo, Bunkyo-ku, Tokyo, 113Japan
T. Nagai
Affiliation:
Department of Communications, Faculty of Engineering, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa, 259–12Japan
T. Shiraishi
Affiliation:
Department of Communications, Faculty of Engineering, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa, 259–12Japan
Get access

Abstract

The addition of nitrous oxide (N2O) gas in the hot-filament chemical vapor deposition of carbon film from mixtures of methane and hydrogen was found to increase remarkably the content of diamond structure in the film. Increased particle size and crystal orientation parallel to the (111) direction were also obtained by the N2O addition. Mass spectrometry revealed that the vapor phase reaction was scarcely affected by the N2O addition.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Matsumoto, S., Hino, M., and Kobayashi, T., Appl. Phys. Lett. 51, 737 (1987).Google Scholar
2. Mitsuda, Y., Yoshida, T., and Akashi, K., Rev. Sci. Instr. 60, 249 (1989).Google Scholar
3. Akatsuka, Y. and Hirose, Y., Jpn. J. Appl. Phys. 27, L1600 (1988).Google Scholar
4. Hirose, Y. and Terasawa, Y., Jpn. J. Appl. Phys. 25, L519 (1986).Google Scholar
5. Kawato, T. and Kondo, K., Jpn. J. Appl. Phys. 26, 1429 (1987).Google Scholar