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Dynamics of Ga Clusters on GaAs(001) Surface

Published online by Cambridge University Press:  17 March 2011

Shiro Tsukamoto
Affiliation:
National Research Institute for Metals 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, JAPAN
Nobuyuki Koguchi
Affiliation:
National Research Institute for Metals 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, JAPAN
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Abstract

Dynamics of Ga clusters and GaAs epitaxial growth on a GaAs (001) surface were successfully observed by a system in which scanning tunneling microscopy (STM) and molecular beam epitaxy (MBE) were incorporated into one unit rather than in separate chambers. With the substrate temperature of 528°C, reflection high-energy diffraction (RHEED) patterns showed a (4×6) Ga-stabilized surface reconstruction and dynamics of steps and islands were clearly observed. The detaching and attaching of small Ga clusters might cause the change of steps and islands. It seems that the small Ga clusters migrated with the diameter of about 0.8 to 1.2 nm and around the steps and islands. These clusters could be observed only when they were detached from or attached to the steps and islands. Moreover, even under the substrate temperature of 440 oC and the As4 partial pressure of 2×10−6 torr, STM images were clearly observed. After 0.1 ML Ga was additionally supplied to the sample by migration enhanced epitaxy mode, step flow growth occurred, resulting in an additional GaAs layer grown on the B-step side. Moreover, the c(4×4) As-stabilized surface reconstruction was moderate. It seems that there is an equilibrium additional layer of As amorphous adatoms on the c(4x4) surface reconstructions.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

1. Biegelsen, D.K., Bringans, R.D., Northrup, J.E., and Swartz, L.E., Phys.Rev. B 41, 5701 (1990)Google Scholar
2. Tanaka, I., Ohkouchi, S., Kato, T., and Osaka, F., J.Vac.Sci.&Technol. B9, 2277 (1991)Google Scholar
3. Orr, B.G., Snyder, C.W., and Johnson, M., Rev.Sci. Instrum. 62, 1400 (1991)Google Scholar
4. Tanimoto, M., Osaka, J., Takegami, T., Hirono, S., and Kanisawa, K., Ultramicroscopy 42/44, 1275 (1992)Google Scholar
5. Hashizume, T., Xue, Q., Zhou, J., Ichimiya, A., and Sakurai, T., Phys.Rev.Lett. 73, 2208 (1994)Google Scholar
6. Avery, A.R., Dobbs, H.T., Holmes, D.M., Joyce, B.A., and Vvedensky, D.D., Phys.Rev.Lett. 79, 3938 (1997)Google Scholar
7. Itoh, M., Bell, G.R., Avery, A.R., Jones, T.S., Joyce, B.A., and Vvedensky, D.D., Phys.Rev.Lett. 81, 633 (1998)Google Scholar
8. Yamaguchi, H. and Horikoshi, Y., Jpn.J.Appl.Phys. 28, L1456 (1989)Google Scholar
9. Horikoshi, Y., Yamaguchi, H., Briones, F., and Kawashima, M., J.Cryst.Growth 105, 326 (1990)Google Scholar
10. Yamaguchi, H. and Horikoshi, Y., Jpn.J.Appl.Phys. 30, 802 (1991)Google Scholar
11. Tsukamoto, S. and Koguchi, N., Tenth International Conference on Molecular Beam Epitaxy, Cannes, France, August 31-September 4, 1998, pp.116117; J.Cryst.Growth 201/202, 118 (1999)Google Scholar
12. Tsukamoto, S. and Koguchi, N., J.Cryst.Growth 209, 258 (2000)Google Scholar
13. Avery, A.R., Homes, D.M., Sudijono, J.L., Jones, T.S., and Joyce, B.A., Surf.Sci. 323, 91 (1995)Google Scholar
14. Tsukamoto, S. and Koguchi, N., Jpn.J.Appl.Phys., 33, L1185 (1994); J.Cryst.Growth 150, 33 (1995)Google Scholar
15. Xue, Q., Hashizume, T., Zhou, J.M., Sakata, T., Ohno, T., and Sakurai, T., Phys.Rev.Lett. 74, 3117 (1995)Google Scholar
16. Ichimiya, A., Tanaka, Y., and Ishiyama, K., Phys.Rev.Lett. 76, 4721 (1996)Google Scholar
17. Ichimiya, A., Tanaka, Y., and Hayashi, K., Surf.Sci. 386, 182 (1997)Google Scholar
18. Johnson, M.D., Leung, K.T., Birch, A., and Orr, B.G., J.Cryst.Growth 174, 572 (1997)Google Scholar
19. Foxon, C.T., Joyce, B.A., and Norris, M.T., J.Cryst.Growth 49, 132 (1980)Google Scholar
20. Kobayashi, Y., Uwai, K., and Kobayashi, N., Jpn.J.Appl.Phys. 34, 3008 (1995)Google Scholar
21. Ohachi, T., Feng, J.M., and Asai, K., J.Cryst.Growth 211, 405 (2000)Google Scholar
22. Ito, T., Shiraishi, K., and Ohno, T., Appl.Surf.Sci. 82/83, 208 (1994)Google Scholar