Undoped 69GaAs/71GaAs isotope superlattice structures grown by MBE on n-type GaAs substrates, doped by Si to ∼3×1018 cm−3, have been used to study Ga self-diffusion in GaAs by disordering reactions. In the temperature range of 850–960°C, the SIMS measured Ga self-diffusivity values showed an activation enthalpy of 4 eV, and are larger than previously compiled Ga self-diffusivity and Al-Ga interdiffusivity values obtained under thermal equilibrium and intrinsic conditions, which are characterized by a 6 eV activation enthalpy. SIMS, CV, and TEM characterizations showed that the as-grown superlattice layers were intrinsic which became p-type with hole concentrations up to ∼2×1017 cm−3 after annealing, because the layers contain carbon. Dislocations of a density of ∼106-107 cm−2 were also present. However, the factor responsible for the presently observed larger Ga self-diffusivity values appears to be Si outdiffusion from the substrate, which was determined using CV measurements. Outdiffusion of Si decreases the n value in the substrate which causes the release of excess Ga vacancies into the superlattice layers where the supersaturated Ga vacancies enhance Ga self-diffusion.