Hostname: page-component-76fb5796d-45l2p Total loading time: 0 Render date: 2024-04-27T01:19:48.928Z Has data issue: false hasContentIssue false
  • English
  • Français

A Discussion of Electronic Optical Absorption Spectra of Nanocrystalline Silicon thin Films

Published online by Cambridge University Press:  21 February 2011

Etienne Bustarret  and
M.A. Hachicha
Etienne Bustarret
Affiliation:
Max-Planck-Institute für Festkörperforschung, D-7000 Stuttgart 80, FRG
M.A. Hachicha
Affiliation:
Lab. Etudes de Propriétés Electroniques des Solides, CNRS, BP 166x, F-38042, Grenoble, France, (associated to Univ. J. Fourier de Grenoble)
Get access

Abstract

Both fully crystallized nanocrystalline as-deposited silicon layers with an average grain size ranging between 6 and 80 nm and mixed-phase hydrogenated doped and undoped silicon films are studied at room temperature by Photothermal Deflection Spectroscopy (PDS), Transmission Spectroscopy and Spectroscopic Ellipsometry. The differences with regard to similar data obtained on monocrystalline and hydrogenated amorphous silicon are discussed, with an emphasis on the low-energy part of the 0.6-5.6 eV explored range.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 164: Symposium H – Materials Issues in Microcrystalline Semiconductors , 1989 , 211
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Vepřek, S., Mařeček, V., Solid State Electron. 11, 683 (1968).Google Scholar
[2] Morel, M., Morin, F., Appl. Phys. Lett. 35, 686 (1979).Google Scholar
[3] Ishida, H., Noda, M., Shimizu, H., Jap. J. Appl. Phys. 22, L73 (1983).Google Scholar
[4] Ushida, Y., Ishimura, T., Ueno, M., Ohasawa, M., J. Phys.(Paris) 42, C4–265 (1981).Google Scholar
[5] Harbeke, G., in “Polycrystalline Semiconductors”, Springer Series on Solid St. Sciences, 57, 156 (1985), and references therein.Google Scholar
[6] Richter, H., Ley, L., J. Appl. Phys. 52, 7281 (1981).Google Scholar
[7] Iqbal, Z., Sarott, F.A., S. Vepřek, J. Phys. C 16, 2005 (1983).Google Scholar
[8] Dash, W.C., Newman, R., Phys. Rev. 99, 1151 (1955).Google Scholar
[9] Vepfek, S., Sarott, F.A., Iqbal, Z., Phys. Rev. B 36, 3344 (1987).Google Scholar
[10] Matsuda, M., Matsumura, M., Yamasaki, S., Yamamoto, H., Imura, T., Okushi, H., lizima, S., Tanaka, K., Jap. J. Appl. Physics 20, L183 (1981).Google Scholar
[11] Hata, T., Hatsuda, T., Komatsu, T., Jap. J. Appl. Physics 24, 1463 (1985).Google Scholar
[12] Kumar, S., Drevillon, B., Godet, C., J. Appl. Physics 60, 1542 (1986).Google Scholar
[13] Aspnes, D.E., Thin Solid Films 89, 249 (1982).Google Scholar
[14] Logothetidis, S., J. Appl. Phys. 65, 2416 (1989).Google Scholar
[15] Bagley, B.G., Aspnes, D.E., Adams, A.C.A., Mogab, C.J., Appl. Phys. Lett. 38, 56 (1981).Google Scholar
[16] Hachicha, M.A., Bruyere, J.C., Bustarret, E., Deneuville, A., Brunel, M., “Ion and Plasma Assisted Techniques 87”, Int. Conf. Proc. published by Conferences Exhibitions Publications Consultants Ldt, Edinburgh (UK), p. 360 (1987).Google Scholar
[17] Vepřek, S., Heintze, M., Sarott, F.A., Jurcik-Rajman, M., Willmott, P., Mater. Res. Soc. Symp. Proc. 118, 3 (1988).Google Scholar
[18] Bustarret, E., Hachicha, M.A., Brunel, M., Appl. Phys. Lett. 52, 1675 (1988).Google Scholar
[19] Liu, Hsiang-Na, Pfost, D., Tauč, J., Solid St. Comm. 50, 987 (1984).Google Scholar
[20] Mishima, Y., Hirose, M., Osaka, Y., J. Appl. Phys. 51, 1157 (1980).Google Scholar
[21] Macfarlane, G.G., McLean, T.P., Quarrington, J.E., Roberts, V., Phys. Rev. 111, 1245 (1958).Google Scholar
[22] Tsu, R., in “Disordered Semiconductors”, Kastner, M.A., Thomas, G.A., Ovshinksy, S.R., Eds., Plenum Press, New York (1987), p. 479.Google Scholar
[23] Welber, B., Kim, C.K., Cardona, M., Rodriguez, S., Solid St. Comm. 17, 1201 (1975).Google Scholar
[24] Hachicha, M.A., Bustarret, E., this volume.Google Scholar