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Diamond Forming Discharges

Published online by Cambridge University Press:  21 February 2011

Peter K. Bachmann  and
Hans Lydtin
Peter K. Bachmann
Affiliation:
Philips Research Laboratories, P.O.Box 1980, D-5100 Aachen, West Germany
Hans Lydtin
Affiliation:
Philips Research Laboratories, P.O.Box 1980, D-5100 Aachen, West Germany
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Abstract

Methods to prepare diamond thin films by means plasma chemical vapor deposition are reviewed. The various techniques available to date are compared with respect to their deposition rates, deposition area, quality and homogeneity of the material produced, and their specific advantages and drawbacks. The deposition rates of both thermally induced and plasma induced CVD methods correlate well with the gas temperature in the reaction zone supporting the hypothesis that the large quantities of diamond precursor species necessary for high deposition rates are formed in a hot spot of the deposition system.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 165 , 1989 , 181
Copyright
Copyright © Materials Research Society 1990

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