Hostname: page-component-848d4c4894-mwx4w Total loading time: 0 Render date: 2024-06-21T01:58:08.782Z Has data issue: false hasContentIssue false
  • English
  • Français

Diamond Deposition by a Nonequilibrium Plasma Jet

Published online by Cambridge University Press:  15 February 2011

D. G. Keil ,
H. F. Calcote  and
W. Felder
D. G. Keil
Affiliation:
AeroChem Research Laboratories, Inc., P.O. Box 12, Princeton, NJ 08542
H. F. Calcote
Affiliation:
AeroChem Research Laboratories, Inc., P.O. Box 12, Princeton, NJ 08542
W. Felder
Affiliation:
AeroChem Research Laboratories, Inc., P.O. Box 12, Princeton, NJ 08542
Get access

Abstract

A nonequilibrium plasma jet has been used to deposit diamond films on a number of substrates, including silicon, silicon nitride, alumina, and molybdenum. Hydrogen is passed through a glow discharge and expanded through a supersonic nozzle to produce a highly nonequilibrium jet. Methane is added downstream of the nozzle, where it mixes and reacts with the nonequilibrium concentration of hydrogen atoms. The resulting supersonic jet strikes the substrate surface producing a high quality (determined by laser Raman spectrometry) adherent diamond film. Because of the low jet temperature, substrate cooling is unnecessary. Diamond deposition rates have exceeded 2 mg/kWh and I μm/h averaged over 16 cm2 area; good quality films prepared at substrate temperatures below 600 K. have been

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 250: Symposium R – Chemical Vapor Deposition of Refractory Metals and Ceramics II , 1991 , 351
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Angus, J. C. and Hayman, C. C., Science, 241, 915 (1988).CrossRefGoogle Scholar
2. Yarbrough, W. A. and Messier, R., Science, 247, 688 (1990).Google Scholar
3. Bachmann, P. K., Leers, D., and Lydtin, H., Diamond Rel. Mater., 1, 1 (1991).Google Scholar
4. Fenn, J. B., “Electrical Discharge Jet Streams,” U.S. Patent 3,005,762, October 1961.Google Scholar
5. Calcote, H. F., “Process for Forming Diamond Coating Using a Silent Discharge Plasma Jet Process,” U.S. patent pending.Google Scholar
6. Kuhihara, K., Sasaki, K., Kawarada, M., and Koshino, N., Appl. Phys. Lett., 52, 437 (1988).Google Scholar
7. Robins, L. H., Farabaugh, E. N., and Feldman, A., J. Mater Res.,5, 2456 (1990).Google Scholar
8. Matsumoto, S., Hosoya, I., and Chounan, T., Jpn. J. Appl. Phys., 29, 2082 (1990).Google Scholar
9. Tsai, C., Gerberich, W., Lu, Z. P., Heberlein, J., and Pfender, E., J. Mater. Res., 6, 2127 (1991).Google Scholar