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Development Of Robust Multilayer Optics For Use In High-Peak Power Radiation Environments

Published online by Cambridge University Press:  15 February 2011

Brian J. Macgowan ,
S. Mrowka ,
T. W. Barbee JR. ,
L. B. DA SILVA ,
D.C. EDER ,
J.A. Koch ,
J.A. Turner  and
J. H. Underwood
Brian J. Macgowan
Affiliation:
Lawrence Livermore National Laboratory, University of California, L-476, P.O. Box 808, Livermore, CA 94550, U.S.A.
S. Mrowka
Affiliation:
Lawrence Livermore National Laboratory, University of California, L-476, P.O. Box 808, Livermore, CA 94550, U.S.A.
T. W. Barbee JR.
Affiliation:
Lawrence Livermore National Laboratory, University of California, L-476, P.O. Box 808, Livermore, CA 94550, U.S.A.
L. B. DA SILVA
Affiliation:
Lawrence Livermore National Laboratory, University of California, L-476, P.O. Box 808, Livermore, CA 94550, U.S.A.
D.C. EDER
Affiliation:
Lawrence Livermore National Laboratory, University of California, L-476, P.O. Box 808, Livermore, CA 94550, U.S.A.
J.A. Koch
Affiliation:
Lawrence Livermore National Laboratory, University of California, L-476, P.O. Box 808, Livermore, CA 94550, U.S.A.
J.A. Turner
Affiliation:
Lawrence Livermore National Laboratory, University of California, L-476, P.O. Box 808, Livermore, CA 94550, U.S.A.
J. H. Underwood
Affiliation:
Lawrence Berkeley Laboratory, 1 Cyclotron Road, Bldg 2–400, Berkeley, CA 94720, U.S.A.
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Abstract

In many applications, x-ray mulhilayer mirrors are exposed to high peak fluxes of x-rays with subsequent damage to the mirror. Mirror damage is a particularly severe problem with the use of multilayers as cavity optics for short wavelength x-ray lasers. Intense optical and x-ray radiation, from the x-ray laser plasma amplifier, often damages the multilayer mirror on time scales of hundreds of picoseconds. The phenomenon of multilayer mirror damage by pulsed xray emission has been studied using short duration (500 psec) bursts of soft x-rays from a laser produced gold plasma. The results of the experiments will be compared with some simple models and the possibility of increasing the damage thresholds of short wavelength multilayer mirrors will be discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 306: Symposium K – Materials Aspects of X-Ray Lithography , 1993 , 145
Copyright
Copyright © Materials Research Society 1993

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References

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