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Development of High Temperature Optical Interference Filters

Published online by Cambridge University Press:  27 February 2013

Thomas C. Parker  and
John D. Demaree
Thomas C. Parker
Affiliation:
U.S. Army Research Lab, 4600 Deer Creek Loop, Aberdeen Proving Grounds, MD 21005, U.S.A.
John D. Demaree
Affiliation:
U.S. Army Research Lab, 4600 Deer Creek Loop, Aberdeen Proving Grounds, MD 21005, U.S.A.
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Abstract

Oblique angle deposition (OAD) is a self-organizing physical vapor deposition (PVD) technique that has been used to grow sculpted 3D nanostructures including helices, slanted rods, and zigzag structures, and other shapes. OAD structures can be fabricated from virtually any material that can be deposited using PVD including: polymers, metals, semiconductors, oxides, and nitrides. The control over the nano-scale structural anisotropy of these materials allows one to tailor their electrical, magnetic, mechanical, crystalline, and optical properties. Through the careful design of the OAD structure and material selection this technique can be used to create photonic materials (1D, 2D, and 3D) with unique properties. We will discuss ongoing work using OAD to develop oxide thin film interference filters that can withstand extreme temperatures (800-1000° C) at mTorr vacuum levels, which are being developed for thermal photovoltaic applications.

Keywords

optical propertiesthin filmphotovoltaic
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1494: Symposium F – Oxide Semiconductors and Thin Films , 2013 , pp. 351 - 356
Copyright
Copyright © Materials Research Society 2013 

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References

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