This is a copy of the slides presented at the meeting but not formally written up for the volume.
Homoepitaxial SrTiO3 thin films were grown on SrTiO3 (001) via Pulsed Laser Deposition. The growth was monitored in real-time by in situ X-ray reflectivity measurements at the anti-Bragg point of the (00L) Crystal Truncation Rod. Due to the need for a large X-ray intensity to monitor the anti-Bragg position, these experiments were performed at the Cornell High Energy Synchrotron Source (CHESS). We investigated the role of laser repetition rate and substrate temperature for films deposited at an O2 background pressure of 10-6 Torr. We observe a transition in growth mode from layer-by-layer to step-flow with increasing temperature while keeping laser repetition rate constant. We observed a similar transition in the growth mode when the substrate temperature is held constant and the laser repetition rate is decreased. The surface miscut is also observed to play a similar role. We show that this transition can be described in terms of the deposition rate, diffusion length, and step spacing.