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Detection of Copper and Water in Low-k Dielectrics by Triangular Voltage Sweep Measurements
Published online by Cambridge University Press: 01 February 2011
Abstract
Metal-Insulator-Semiconductor (MIS) planar capacitors were fabricated in order to systematically investigate the effect of Cu and water in Cu/low-k structures by Triangular Voltage Sweep (TVS) measurements. We were able to resolve peculiar features in the TVS traces of Cu and water contaminated samples, which were related to Cu ions and protons, respectively. We demonstrate that these features can be used to distinguish the two ionic species. As these features do not depend on the specific dielectric, we provide a methodology to detect and distinguish Cu and water in porous low-k materials embedded in MIS structures.
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- Copyright © Materials Research Society 2006
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