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A Detailed Study of the Synthesis of Bismuth Thin Films by PVD-Methods and their Structural Characterization

  • Enrique Camps (a1), Sandra E. Rodil (a2), J. Antonio Salas (a3) and Horacio V. Estrada (a3)

Abstract

A comprehensive and rather complete study for the synthesis of Bismuth thin-films using physical vapor deposition (PVD) techniques aimed at identifying key features of their crystallographic structure and morphology/topography, as a function of the synthesis method is presented. These films were deposited on oxidized and non-oxidized polished silicon substrates, glass-plates and polyimide flexible films, by thermal evaporation (resistive boat and e-beam) DC- and RF-magnetron assisted sputtering, and pulsed laser (ablation) deposition (PLD). The synthesis was performed controlling the main deposition parameters of these methods.

XRD-spectra conclusively indicate that the films can be preferentially oriented along the [003] or [012] Bi-structure’s directions, depending on the source-to- substrate (STS)-distance, sputtering power, substrate’s temperature and PLD ion’s kinetic energy. It is also concluded that a relatively short STS-distance results in a rather polycrystalline structure, near independent to the used sputtering power.

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A Detailed Study of the Synthesis of Bismuth Thin Films by PVD-Methods and their Structural Characterization

  • Enrique Camps (a1), Sandra E. Rodil (a2), J. Antonio Salas (a3) and Horacio V. Estrada (a3)

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