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Depth Dependence of Residual Strains in Textured Mo Thin Films Using High-Resolution X-Ray Diffraction

  • S. G. Malhotra (a1), Z. U. Rek (a1) (a2), S. M. Yalisove (a1) and J. C. Bilello (a1)

Abstract

The magnitude of the average stress in a thin film can be obtained by measuring the curvature of the film-substrate couple. However, the details of the strain distribution, as a function of depth through the thickness of the film, can have important consequences in governing film quality and ultimate morphology. A high-resolution x-ray diffraction method was used to determine the depth dependence of strain in a textured Mo film, with a nominal thickness of 260 nm, which was deposited by planar magnetron sputtering onto Si (100) substrates. The principal strains, resolved onto a laboratory reference frame, displayed a negligible gradient in the azimuthal directions (x and y), but displayed a large gradient in the direction normal to the film (z). A similar trend was previously observed for a 100 nm polycrystalline film, but the magnitude of the normal strain very near the free surface was about a factor of 2 less. The increase in the normal strain may be due to the development of a preferred growth direction and grain facetting. A linear elastic model was also used to determine the strains in successive slabs of the film, where strain variations between slabs were indicated.

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1. Venkatraman, R., Bravman, J.C., Nix, W.D., Davies, P.W., Flinn, P.A., and Fraser, D.B., J. Elect. Mater. 19, 1231 (1990).
2. Nolan, T.P., Sinclair, R., Ranjan, R., and Yamashita, T., Ultramicroscopy 47, 437 (1992).
3. Karpenko, O.P., Bilello, J.C., and Yalisove, S.M., J. Appl. Phys. 76, 4610 (1994).
4. Hoffman, D.W. and Thornton, J.A., J. Vac. Sci. Technol. 16, 134 (1979).
5. Hoffman, D.W. and Thornton, J.A., J. Vac. Sci. Technol. 20, 355 (1982).
6. Flinn, P.A., Mat. Res. Symp. Proc., Vol.130, p. 41 (1989).
7. Tao, J., Lee, L.H., and Bilello, J.C., J. Elect. Mat. 20, 819 (1991).
8. Dölle, H. and Hauk, V., Z. Metallkd. 68, 728 (1977).
9. Dölle, H., J. Appl. Cryst. 12, 489 (1979).
10. Bollenrath, F., Hauk, V., and Weidemann, W., Z. Metallkd. 58, 643 (1967).
11. Marion, R.H. and Cohen, J.B., Adv. X-ray Anal. 18, 466 (1975).
12. Marra, W.C., Eisenberger, P., and Cho, A.Y., J. Appl. Phys. 50, 6927 (1979).
13. Eisenberger, P. and Marra, W.C., Phys. Rev. Lett. 46, 1081 (1981).
14. Doerner, M.F. and Brennan, S., J. Appl. Phys. 63, 126 (1988).
15. Shute, C.J. and Cohen, J.B., J. Appl. Phys. 70, 2104 (1991).
16. Venkatraman, R., Besser, Paul, and Bravman, John C., J. Mater. Res. 9, 328 (1994).
17. Besser, Paul R., Brennan, Sean, and Bravman, John C., J. Mater. Res. 9, 13 (1994).
18. Parfitt, L.J., private communication.
19. Dosch, H., Phys. Rev. B 35, 2137 (1987).
20. Schultz, L.G., J. Appl. Phys. 20, 1030 (1949).
21. Imura, T., Weissmann, S., and Slade, J.J., Jr., Acta. Cryst. 15, 786 (1962).
22. Nye, J.F., Physical Properties of Crvstals (Oxford Univeristy Press, 1985).

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Depth Dependence of Residual Strains in Textured Mo Thin Films Using High-Resolution X-Ray Diffraction

  • S. G. Malhotra (a1), Z. U. Rek (a1) (a2), S. M. Yalisove (a1) and J. C. Bilello (a1)

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