Skip to main content Accessibility help
×
Home

Deposition of Thin Alumina Films from Supercritical Water Jets

  • J. I. Brand (a1) and D. R. Miller (a1)

Abstract

Thin alumina films are grown on a silicon substrate, in vacuum, at a rate of about 10 Å per second, and at substrate temperatures below 1500C. Alumina is dissolved in supercritical water and the resulting solution expanded in a supersonic free jet, which is directed at the substrate. The films are characterized by ESCA and FTIR.

Copyright

References

Hide All
1. Brand, J.I. and Miller, D.R., Thin Solid Films, to appear 1988
2. Matson, D., Peterson, R., and Smith, R.J., J. Mat. Sci. 22 1919 (1987).
3. Anderson, J.B., in Molecular Beams and Gas Dynamics, ed. by Wegener, P. (Marcel Dekker, New York, 1974) p. 167.
4. Ganeyev, I.G. and Rumyantsev, V.N., Geokhimiya 9, 1402 (1974)
5. Wefers, K. and Misra, C., Oxides and Hydroxides of Aluminum, Alcoa Technical Paper No. 19, revised, Alcoa Laboratories (1987).

Deposition of Thin Alumina Films from Supercritical Water Jets

  • J. I. Brand (a1) and D. R. Miller (a1)

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed