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Current induced organization in thin nanocrystalline gold films during deposition

Published online by Cambridge University Press:  21 March 2011

P. Chaoguang ,
J. Ederth ,
L. B. Kish  and
C. G. Granqvist
P. Chaoguang
Affiliation:
Department of Materials Science, The Angstrom Laboratory, Uppsala University, P. O. Box 534, SE-75121, Uppsala, Sweden
J. Ederth
Affiliation:
Department of Materials Science, The Angstrom Laboratory, Uppsala University, P. O. Box 534, SE-75121, Uppsala, Sweden
L. B. Kish
Affiliation:
Department of Materials Science, The Angstrom Laboratory, Uppsala University, P. O. Box 534, SE-75121, Uppsala, Sweden
C. G. Granqvist
Affiliation:
Department of Materials Science, The Angstrom Laboratory, Uppsala University, P. O. Box 534, SE-75121, Uppsala, Sweden
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Abstract

Nanocrystalline gold films were prepared by advanced gas deposition. Electric field induced effects on the film structure during and after deposition was investigated. A dc electric field in the range 2 ≤Ua ≤ 8 V/cm, was applied parallel to the substrate surface and led to changes of film microstructure and resistivity. In another set of experiments, films deposited at Ua = 0 were exposed to electric fields of similar strength after deposition. Film degradation could be understood from a mechanism consistent with a biased-percolation effect. Our results show that it is possible to control the film structure by varying the strength of an applied electric field.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 676: Symposium Y – Synthesis, Functional Properties and Applications of Nanostructures , 2001 , Y8.1
Copyright
Copyright © Materials Research Society 2001

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References

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