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Coplanar Capacitors with High Dielectric Constant BaSrTiO3 for Microwave Application

  • Wei Hu (a1), Vladimir Fuflyigin (a1) and Jim Chi (a1)

Abstract

A coplanar structure is shown to be free of the asymmetrical I-V characteristics normally observed in MIM capacitors with BST inter-electrode dielectric. The low barrier height at the bottom interface is found to be responsible for the asymmetry, which causes increased leakage current and reduced breakdown voltage in one bias polarity. These problems can be eliminated using a coplanar structure, which has been shown elsewhere to have a very low parasitic inductance and a very high resonant frequency. However, these improvements are realized at the cost of a four times reduction of capacitance per unit area.

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1. See for example, Mat. Res. Soc. Symp. Proc. Vol.541, Ferroelectric Thin Films VII, (1998)
2. Fuflyigin, V., Li, K. K., Wang, F., Jiang, H., Liu, S., Zhao, J., Norris, P., Yip, P., in High-Temperature Superconductors and Novel Inorganic Materials, edited by Tendeloo, G. Van, (Kluwer Academic.Publ. 1999), p.279284.
3. Dietz, G. W., Chumacher, M., Waser, R., Streiffer, S. K., Basceri, C., and Kingon, A. I., J. Appl. Phys., 82, 2359, 1997.
4. Dietz, G. W. and Waser, R., Thin Solid Films, 299, 53, 1997.
5. Hwang, C. S., Lee, B. T., Kang, C. S., Lee, K. H., Cho, H. J., Hideki, H., Kim, W. D., Lee, S. I., and Lee, M. Y, J. Appl. Phys., 85, 287, 1999.
6. Schaper, L., Ulrich, R., Nelms, D., Porter, E., Lenihan, T., and Wan, C., p. 724, Proceedings of the 1997 Electronic Component and Technology Conference.

Coplanar Capacitors with High Dielectric Constant BaSrTiO3 for Microwave Application

  • Wei Hu (a1), Vladimir Fuflyigin (a1) and Jim Chi (a1)

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