Amorphous SiGe/SiO2 multilayers with controlled thickness in the range of nanometers have been deposited by LPCVD at low temperature in a single multistep run. Continuous and discontinuous layers have been deposited. No intermixing between the SiGe and SiO2 layers has been observed. As-deposited and crystallized multilayers have been characterized by Raman spectroscopy, Cathodoluminescence and TEM. The luminescence emission is more intense in the discontinuous layers than in the continuous ones.